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Chlorinated Byproduct Formation during the Electrochemical Advanced Oxidation Process at Magnéli Phase Ti4O7 Electrodes.
Lin, Meng-Hsuan; Bulman, Devon Manley; Remucal, Christina K; Chaplin, Brian P.
Afiliação
  • Lin MH; Department of Chemical Engineering, University of Illinois at Chicago, 929 West Taylor Street, Chicago, Illinois 60607, United States.
  • Bulman DM; Environmental Chemistry and Technology Program, University of Wisconsin-Madison, 660 North Park Street, Madison, Wisconsin 53706, United States.
  • Remucal CK; Environmental Chemistry and Technology Program, University of Wisconsin-Madison, 660 North Park Street, Madison, Wisconsin 53706, United States.
  • Chaplin BP; Department of Civil and Environmental Engineering, University of Wisconsin-Madison, 660 North Park Street, Madison, Wisconsin 53706, United States.
Environ Sci Technol ; 54(19): 12673-12683, 2020 10 06.
Article em En | MEDLINE | ID: mdl-32841010
ABSTRACT
This research investigated chlorinated byproduct formation at Ti4O7 anodes. Resorcinol was used as a model organic compound representative of reactive phenolic groups in natural organic matter and industrial phenolic contaminants and was oxidized in the presence of NaCl (0-5 mM). Resorcinol mineralization was >68% in the presence and absence of NaCl at 3.1 V/SHE (residence time = 13 s). Results indicated that ∼4.3% of the initial chloride was converted to inorganic byproducts (free Cl2, ClO2-, ClO3-) in the absence of resorcinol, and this value decreased to <0.8% in the presence of resorcinol. Perchlorate formation rates from chlorate oxidation were 115-371 mol m-2 h-1, approximately two orders of magnitude lower than reported values for boron-doped diamond anodes. Liquid chromatography-mass spectroscopy detected two chlorinated organic products. Multichlorinated alcohol compounds (C3H2Cl4O and C3H4Cl4O) at 2.5 V/SHE and a monochlorinated phenolic compound (C8H7O4Cl) at 3.1 V/SHE were proposed as possible structures. Density functional theory calculations estimated that the proposed alcohol products were resistant to direct oxidation at 2.5 V/SHE, and the C8H7O4Cl compound was likely a transient intermediate. Chlorinated byproducts should be carefully monitored during electrochemical advanced oxidation processes, and multibarrier treatment approaches are likely necessary to prevent halogenated byproducts in the treated water.
Assuntos

Texto completo: 1 Base de dados: MEDLINE Assunto principal: Titânio / Poluentes Químicos da Água Idioma: En Ano de publicação: 2020 Tipo de documento: Article

Texto completo: 1 Base de dados: MEDLINE Assunto principal: Titânio / Poluentes Químicos da Água Idioma: En Ano de publicação: 2020 Tipo de documento: Article