Demonstration of a ring-FEL as an EUV lithography tool.
J Synchrotron Radiat
; 27(Pt 4): 864-869, 2020 Jul 01.
Article
em En
| MEDLINE
| ID: mdl-33565994
ABSTRACT
This paper presents the required structure and function of a ring-FEL as a radiation source for extreme ultraviolet radiation lithography (EUVL). A 100â
m-long straight section that conducts an extremely low emittance beam from a fourth-generation storage ring can increase the average power at 13.5â
nm wavelength to up to 1â
kW without degrading the beam in the rest of the ring. Here, simulation results for a ring-FEL as a EUVL source are described.
Texto completo:
1
Base de dados:
MEDLINE
Idioma:
En
Ano de publicação:
2020
Tipo de documento:
Article