Sub-5 nm Lithography with Single GeV Heavy Ions Using Inorganic Resist.

Liu, Qing; Zhao, Jing; Guo, Jinlong; Wu, Ruqun; Liu, Wenjing; Chen, Yiqin; Du, Guanghua; Duan, Huigao.

Afiliação

Liu Q; National Engineering Research Center for High Efficiency Grinding, State-Key Laboratory of Advanced Design and Manufacturing for Vehicle Body, College of Mechanical and Vehicle Engineering, Hunan University, Changsha 410082, China.
Zhao J; Institute of Modern Physics, Chinese Academy of Sciences, Lanzhou 730000, China.
Guo J; University of Chinese Academy of Sciences, Beijing 100049, China.
Wu R; Institute of Modern Physics, Chinese Academy of Sciences, Lanzhou 730000, China.
Liu W; University of Chinese Academy of Sciences, Beijing 100049, China.
Chen Y; Institute of Modern Physics, Chinese Academy of Sciences, Lanzhou 730000, China.
Du G; University of Chinese Academy of Sciences, Beijing 100049, China.
Duan H; Institute of Modern Physics, Chinese Academy of Sciences, Lanzhou 730000, China.

Nano Lett ; 21(6): 2390-2396, 2021 Mar 24.

Article em En | MEDLINE | ID: mdl-33683892