The Influence of Argon Cluster Ion Bombardment on the Characteristics of AlN Films on Glass-Ceramics and Si Substrates.

Nikolaev, Ivan V; Geydt, Pavel V; Korobeishchikov, Nikolay G; Kapishnikov, Aleksandr V; Volodin, Vladimir A; Azarov, Ivan A; Strunin, Vladimir I; Gerasimov, Evgeny Y.

Afiliação

Nikolaev IV; Laboratory of Functional Diagnostics of Low-Dimensional Structures for Nanoelectronics, Novosibirsk State University, 630090 Novosibirsk, Russia.
Geydt PV; Department of Applied Physics, Novosibirsk State University, 630090 Novosibirsk, Russia.
Korobeishchikov NG; Laboratory of Functional Diagnostics of Low-Dimensional Structures for Nanoelectronics, Novosibirsk State University, 630090 Novosibirsk, Russia.
Kapishnikov AV; Department of Applied Physics, Novosibirsk State University, 630090 Novosibirsk, Russia.
Volodin VA; Laboratory of Functional Diagnostics of Low-Dimensional Structures for Nanoelectronics, Novosibirsk State University, 630090 Novosibirsk, Russia.
Azarov IA; Boreskov Institute of Catalysis, Russian Academy of Sciences (Siberian Branch), 630090 Novosibirsk, Russia.
Strunin VI; Laboratory of Functional Diagnostics of Low-Dimensional Structures for Nanoelectronics, Novosibirsk State University, 630090 Novosibirsk, Russia.
Gerasimov EY; Rzhanov Institute of Semiconductor Physics, Russian Academy of Sciences (Siberian Branch), 630090 Novosibirsk, Russia.

Nanomaterials (Basel) ; 12(4)2022 Feb 17.

Article em En | MEDLINE | ID: mdl-35214998