Block Copolymer Nanopatterning for Nonsemiconductor Device Applications.

Yang, Geon Gug; Choi, Hee Jae; Han, Kyu Hyo; Kim, Jang Hwan; Lee, Chan Woo; Jung, Edwin Ino; Jin, Hyeong Min; Kim, Sang Ouk.

Afiliação

Yang GG; National Creative Research Initiative Center for Multi-Dimensional Directed Nanoscale Assembly, Department of Materials Science and Engineering, KAIST, Daejeon 34141, Republic of Korea.
Choi HJ; National Creative Research Initiative Center for Multi-Dimensional Directed Nanoscale Assembly, Department of Materials Science and Engineering, KAIST, Daejeon 34141, Republic of Korea.
Han KH; National Creative Research Initiative Center for Multi-Dimensional Directed Nanoscale Assembly, Department of Materials Science and Engineering, KAIST, Daejeon 34141, Republic of Korea.
Kim JH; National Creative Research Initiative Center for Multi-Dimensional Directed Nanoscale Assembly, Department of Materials Science and Engineering, KAIST, Daejeon 34141, Republic of Korea.
Lee CW; National Creative Research Initiative Center for Multi-Dimensional Directed Nanoscale Assembly, Department of Materials Science and Engineering, KAIST, Daejeon 34141, Republic of Korea.
Jung EI; National Creative Research Initiative Center for Multi-Dimensional Directed Nanoscale Assembly, Department of Materials Science and Engineering, KAIST, Daejeon 34141, Republic of Korea.
Jin HM; Department of Organic Materials Engineering, Chungnam National University, Daejeon, 34134, Republic of Korea.
Kim SO; National Creative Research Initiative Center for Multi-Dimensional Directed Nanoscale Assembly, Department of Materials Science and Engineering, KAIST, Daejeon 34141, Republic of Korea.

ACS Appl Mater Interfaces ; 14(10): 12011-12037, 2022 Mar 16.

Article em En | MEDLINE | ID: mdl-35230079