Designing Rewritable Dual-Mode Patterns using a Stretchable Photoresponsive Polymer via Orthogonal Photopatterning.

Xu, Wen-Cong; Liu, Chengwei; Liang, Shuofeng; Zhang, Dachuan; Liu, Yazhi; Wu, Si.

Afiliação

Xu WC; CAS Key Laboratory of Soft Matter Chemistry, Anhui Key Laboratory of Optoelectronic Science and Technology, Department of Polymer Science and Engineering, University of Science and Technology of China, Hefei, 230026, P. R. China.
Liu C; CAS Key Laboratory of Soft Matter Chemistry, Anhui Key Laboratory of Optoelectronic Science and Technology, Department of Polymer Science and Engineering, University of Science and Technology of China, Hefei, 230026, P. R. China.
Liang S; CAS Key Laboratory of Soft Matter Chemistry, Anhui Key Laboratory of Optoelectronic Science and Technology, Department of Polymer Science and Engineering, University of Science and Technology of China, Hefei, 230026, P. R. China.
Zhang D; CAS Key Laboratory of Soft Matter Chemistry, Anhui Key Laboratory of Optoelectronic Science and Technology, Department of Polymer Science and Engineering, University of Science and Technology of China, Hefei, 230026, P. R. China.
Liu Y; CAS Key Laboratory of Soft Matter Chemistry, Anhui Key Laboratory of Optoelectronic Science and Technology, Department of Polymer Science and Engineering, University of Science and Technology of China, Hefei, 230026, P. R. China.
Wu S; Max Planck Institute for Polymer Research, Ackermannweg 10, 55128, Mainz, Germany.

Adv Mater ; 34(31): e2202150, 2022 Aug.

Article em En | MEDLINE | ID: mdl-35642603