Aluminium metal-insulator-metal structure fabricated by the bottom-up approach.

Watanabe, Rie; Mita, Mai; Okamoto, Takayuki; Isobe, Toshihiro; Nakajima, Akira; Matsushita, Sachiko.

Afiliação

Watanabe R; Department of Materials Science and Engineering, School of Materials and Chemical Technology, Tokyo Institute of Technology S7-7 2-12-1 Ookayama, Meguro-ku Tokyo 152-8550 Japan matsushita.s.ab@m.titech.ac.jp.
Mita M; Department of Materials Science and Engineering, School of Materials and Chemical Technology, Tokyo Institute of Technology S7-7 2-12-1 Ookayama, Meguro-ku Tokyo 152-8550 Japan matsushita.s.ab@m.titech.ac.jp.
Okamoto T; Riken 2-1 Hirosawa, Wako Saitama 351-0198 Japan.
Isobe T; Department of Materials Science and Engineering, School of Materials and Chemical Technology, Tokyo Institute of Technology S7-7 2-12-1 Ookayama, Meguro-ku Tokyo 152-8550 Japan matsushita.s.ab@m.titech.ac.jp.
Nakajima A; Department of Materials Science and Engineering, School of Materials and Chemical Technology, Tokyo Institute of Technology S7-7 2-12-1 Ookayama, Meguro-ku Tokyo 152-8550 Japan matsushita.s.ab@m.titech.ac.jp.
Matsushita S; Department of Materials Science and Engineering, School of Materials and Chemical Technology, Tokyo Institute of Technology S7-7 2-12-1 Ookayama, Meguro-ku Tokyo 152-8550 Japan matsushita.s.ab@m.titech.ac.jp.

Nanoscale Adv ; 2(6): 2271-2275, 2020 Jun 17.

Article em En | MEDLINE | ID: mdl-36133391

Texto completo: 1 Base de dados: MEDLINE Idioma: En Ano de publicação: 2020 Tipo de documento: Article

Texto completo: 1 Base de dados: MEDLINE Idioma: En Ano de publicação: 2020 Tipo de documento: Article