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Device modeling of two-steps oxygen anneal-based submicron InGaZnO back-end-of-line field-effect transistor enabling short-channel effects suppression.
Kim, Donguk; Kim, Je-Hyuk; Choi, Woo Sik; Yang, Tae Jun; Jang, Jun Tae; Belmonte, Attilio; Rassoul, Nouredine; Subhechha, Subhali; Delhougne, Romain; Kar, Gouri Sankar; Lee, Wonsok; Cho, Min Hee; Ha, Daewon; Kim, Dae Hwan.
Afiliação
  • Kim D; School of Electrical Engineering, Kookmin University, Seoul, 02707, Republic of Korea.
  • Kim JH; School of Electrical Engineering, Kookmin University, Seoul, 02707, Republic of Korea.
  • Choi WS; School of Electrical Engineering, Kookmin University, Seoul, 02707, Republic of Korea.
  • Yang TJ; School of Electrical Engineering, Kookmin University, Seoul, 02707, Republic of Korea.
  • Jang JT; School of Electrical Engineering, Kookmin University, Seoul, 02707, Republic of Korea.
  • Belmonte A; imec, Kapeldreef 75, 3001, Leuven, Belgium.
  • Rassoul N; imec, Kapeldreef 75, 3001, Leuven, Belgium.
  • Subhechha S; imec, Kapeldreef 75, 3001, Leuven, Belgium.
  • Delhougne R; imec, Kapeldreef 75, 3001, Leuven, Belgium.
  • Kar GS; imec, Kapeldreef 75, 3001, Leuven, Belgium.
  • Lee W; Advanced Device Research Lab, Semiconductor R&D Center, Samsung Electronics Co., Ltd., Gyeonggi-do, Hwaseong-si, 18448, Republic of Korea.
  • Cho MH; Advanced Device Research Lab, Semiconductor R&D Center, Samsung Electronics Co., Ltd., Gyeonggi-do, Hwaseong-si, 18448, Republic of Korea.
  • Ha D; Advanced Device Research Lab, Semiconductor R&D Center, Samsung Electronics Co., Ltd., Gyeonggi-do, Hwaseong-si, 18448, Republic of Korea.
  • Kim DH; School of Electrical Engineering, Kookmin University, Seoul, 02707, Republic of Korea. drlife@kookmin.ac.kr.
Sci Rep ; 12(1): 19380, 2022 Nov 12.
Article em En | MEDLINE | ID: mdl-36371536

Texto completo: 1 Base de dados: MEDLINE Idioma: En Ano de publicação: 2022 Tipo de documento: Article

Texto completo: 1 Base de dados: MEDLINE Idioma: En Ano de publicação: 2022 Tipo de documento: Article