Your browser doesn't support javascript.
loading
The Temperature Dependence of the Hexagonal Boron Nitride Oxidation Resistance, Insights from First-Principle Computations.
Antipina, Liubov Yu; Varlamova, Liubov A; Sorokin, Pavel B.
Afiliação
  • Antipina LY; Laboratory of Digital Material Science, National University of Science and Technology "MISIS", 4 bld.1 Leninsky Av., Moscow 119049, Russia.
  • Varlamova LA; Laboratory of Digital Material Science, National University of Science and Technology "MISIS", 4 bld.1 Leninsky Av., Moscow 119049, Russia.
  • Sorokin PB; Laboratory of Digital Material Science, National University of Science and Technology "MISIS", 4 bld.1 Leninsky Av., Moscow 119049, Russia.
Nanomaterials (Basel) ; 13(6)2023 Mar 14.
Article em En | MEDLINE | ID: mdl-36985935
In this work, we studied the oxidation stability of h-BN by investigating different variants of its modification by -OH, -O- and -O-O- groups using an atomistic thermodynamics approach. We showed that up to temperatures of ~1700 K, oxygen is deposited on the surface of hexagonal boron nitride without dissociation, in the form of peroxide. Only at higher temperatures, oxygen tends to be incorporated into the lattice of hexagonal boron nitride, except in the presence of defects Nv, when the embedding occurs at all temperatures. Finally, the electronic and magnetic properties of the oxidized h-BN were studied.
Palavras-chave

Texto completo: 1 Base de dados: MEDLINE Idioma: En Ano de publicação: 2023 Tipo de documento: Article

Texto completo: 1 Base de dados: MEDLINE Idioma: En Ano de publicação: 2023 Tipo de documento: Article