Unprecedented atomic surface of silicon induced by environmentally friendly chemical mechanical polishing.

Cui, Xiangxiang; Zhang, Zhenyu; Yu, Shiqiang; Chen, Xin; Shi, Chunjing; Zhou, Hongxiu; Meng, Fanning; Yu, Jiaxin; Wen, Wei.

Afiliação

Cui X; State Key Laboratory of High-Performance Precision Manufacturing, Dalian University of Technology, Dalian 116024, China. zzy@dlut.edu.cn.
Zhang Z; State Key Laboratory of High-Performance Precision Manufacturing, Dalian University of Technology, Dalian 116024, China. zzy@dlut.edu.cn.
Yu S; Yunnan Academy of Macroeconomic Research (Yunnan Academy of Industrial Research), Kunming 650051, China.
Chen X; Dayou Science and Technology Corporation, Beijing 100089, China.
Shi C; School of Mechanical Engineering, Hangzhou Dianzi University, Hangzhou 310018, China.
Zhou H; School of Energy and Power Engineering, Dalian University of Technology, Dalian 116024, China.
Meng F; School of Mechanical Engineering, Hangzhou Dianzi University, Hangzhou 310018, China.
Yu J; School of Manufacturing Science and Engineering, Southwest University of Science and Technology, Mianyang 621010, China.
Wen W; College of Mechanical and Electrical Engineering, Hainan University, Haikou 570228, China.

Nanoscale ; 15(21): 9304-9314, 2023 Jun 01.

Article em En | MEDLINE | ID: mdl-37171082

Texto completo: 1 Base de dados: MEDLINE Idioma: En Ano de publicação: 2023 Tipo de documento: Article

Texto completo: 1 Base de dados: MEDLINE Idioma: En Ano de publicação: 2023 Tipo de documento: Article