X-ray mirrors with sub-nanometre figure errors obtained by differential deposition of thin WSi2 films.
J Synchrotron Radiat
; 30(Pt 4): 708-716, 2023 Jul 01.
Article
em En
| MEDLINE
| ID: mdl-37255023
ABSTRACT
Differential deposition by DC magnetron sputtering was applied to correct for figure errors of X-ray mirrors to be deployed on low-emittance synchrotron beamlines. During the deposition process, the mirrors were moved in front of a beam-defining aperture and the required velocity profile was calculated using a deconvolution algorithm. The surface figure was characterized using conventional off-line visible-light metrology instrumentation (long trace profiler and Fizeau interferometer) before and after the deposition. WSi2 was revealed to be a promising candidate material since it conserves the initial substrate surface roughness and limits the film stress to acceptable levels. On a 300â
mm-long flat Si mirror the average height errors were reduced by a factor of 20 down to 0.2â
nm root mean square. This result shows the suitability of WSi2 for differential deposition. Potential promising applications include the upgrade of affordable, average-quality substrates to the standards of modern synchrotron beamlines.
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2023
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