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In operando cryo-STEM of pulse-induced charge density wave switching in TaS2.
Hart, James L; Siddique, Saif; Schnitzer, Noah; Funni, Stephen D; Kourkoutis, Lena F; Cha, Judy J.
Afiliação
  • Hart JL; Department of Materials Science and Engineering, Cornell University, Ithaca, NY, USA.
  • Siddique S; Department of Materials Science and Engineering, Cornell University, Ithaca, NY, USA.
  • Schnitzer N; Department of Materials Science and Engineering, Cornell University, Ithaca, NY, USA.
  • Funni SD; Department of Materials Science and Engineering, Cornell University, Ithaca, NY, USA.
  • Kourkoutis LF; School of Applied and Engineering Physics, Cornell University, Ithaca, NY, USA.
  • Cha JJ; Kavli Institute at Cornell for Nanoscale Science, Cornell University, Ithaca, NY, USA.
Nat Commun ; 14(1): 8202, 2023 Dec 11.
Article em En | MEDLINE | ID: mdl-38081844
ABSTRACT
The charge density wave material 1T-TaS2 exhibits a pulse-induced insulator-to-metal transition, which shows promise for next-generation electronics such as memristive memory and neuromorphic hardware. However, the rational design of TaS2 devices is hindered by a poor understanding of the switching mechanism, the pulse-induced phase, and the influence of material defects. Here, we operate a 2-terminal TaS2 device within a scanning transmission electron microscope at cryogenic temperature, and directly visualize the changing charge density wave structure with nanoscale spatial resolution and down to 300 µs temporal resolution. We show that the pulse-induced transition is driven by Joule heating, and that the pulse-induced state corresponds to the nearly commensurate and incommensurate charge density wave phases, depending on the applied voltage amplitude. With our in operando cryogenic electron microscopy experiments, we directly correlate the charge density wave structure with the device resistance, and show that dislocations significantly impact device performance. This work resolves fundamental questions of resistive switching in TaS2 devices, critical for engineering reliable and scalable TaS2 electronics.

Texto completo: 1 Base de dados: MEDLINE Idioma: En Ano de publicação: 2023 Tipo de documento: Article

Texto completo: 1 Base de dados: MEDLINE Idioma: En Ano de publicação: 2023 Tipo de documento: Article