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Electrically Controlled All-Antiferromagnetic Tunnel Junctions on Silicon with Large Room-Temperature Magnetoresistance.
Shi, Jiacheng; Arpaci, Sevdenur; Lopez-Dominguez, Victor; Sangwan, Vinod K; Mahfouzi, Farzad; Kim, Jinwoong; Athas, Jordan G; Hamdi, Mohammad; Aygen, Can; Arava, Hanu; Phatak, Charudatta; Carpentieri, Mario; Jiang, Jidong S; Grayson, Matthew A; Kioussis, Nicholas; Finocchio, Giovanni; Hersam, Mark C; Khalili Amiri, Pedram.
Afiliação
  • Shi J; Department of Electrical and Computer Engineering, Northwestern University, Evanston, IL, 60208, USA.
  • Arpaci S; Department of Electrical and Computer Engineering, Northwestern University, Evanston, IL, 60208, USA.
  • Lopez-Dominguez V; Applied Physics Program, Northwestern University, Evanston, IL, 60208, USA.
  • Sangwan VK; Department of Electrical and Computer Engineering, Northwestern University, Evanston, IL, 60208, USA.
  • Mahfouzi F; Institute of Advanced Materials (INAM), Universitat Jaume I, Castellón, 12006, Spain.
  • Kim J; Department of Materials Science and Engineering, Northwestern University, Evanston, IL, 60208, USA.
  • Athas JG; Department of Physics and Astronomy, California State University Northridge, Northridge, CA, 91330, USA.
  • Hamdi M; Department of Physics and Astronomy, California State University Northridge, Northridge, CA, 91330, USA.
  • Aygen C; Department of Electrical and Computer Engineering, Northwestern University, Evanston, IL, 60208, USA.
  • Arava H; Department of Electrical and Computer Engineering, Northwestern University, Evanston, IL, 60208, USA.
  • Phatak C; Department of Electrical and Computer Engineering, Northwestern University, Evanston, IL, 60208, USA.
  • Carpentieri M; Materials Science Division, Argonne National Laboratory, Lemont, IL, 60439, USA.
  • Jiang JS; Materials Science Division, Argonne National Laboratory, Lemont, IL, 60439, USA.
  • Grayson MA; Department of Electrical and Information Engineering, Politecnico di Bari, Bari, 70125, Italy.
  • Kioussis N; Materials Science Division, Argonne National Laboratory, Lemont, IL, 60439, USA.
  • Finocchio G; Department of Electrical and Computer Engineering, Northwestern University, Evanston, IL, 60208, USA.
  • Hersam MC; Applied Physics Program, Northwestern University, Evanston, IL, 60208, USA.
  • Khalili Amiri P; Department of Physics and Astronomy, California State University Northridge, Northridge, CA, 91330, USA.
Adv Mater ; 36(24): e2312008, 2024 Jun.
Article em En | MEDLINE | ID: mdl-38501999
ABSTRACT
Antiferromagnetic (AFM) materials are a pathway to spintronic memory and computing devices with unprecedented speed, energy efficiency, and bit density. Realizing this potential requires AFM devices with simultaneous electrical writing and reading of information, which are also compatible with established silicon-based manufacturing. Recent experiments have shown tunneling magnetoresistance (TMR) readout in epitaxial AFM tunnel junctions. However, these TMR structures are not grown using a silicon-compatible deposition process, and controlling their AFM order required external magnetic fields. Here are shown three-terminal AFM tunnel junctions based on the noncollinear antiferromagnet PtMn3, sputter-deposited on silicon. The devices simultaneously exhibit electrical switching using electric currents, and electrical readout by a large room-temperature TMR effect. First-principles calculations explain the TMR in terms of the momentum-resolved spin-dependent tunneling conduction in tunnel junctions with noncollinear AFM electrodes.
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Texto completo: 1 Base de dados: MEDLINE Idioma: En Ano de publicação: 2024 Tipo de documento: Article

Texto completo: 1 Base de dados: MEDLINE Idioma: En Ano de publicação: 2024 Tipo de documento: Article