ABSTRACT
Measuring overlay between two layers of semiconductor devices is a crucial step during electronic chip fabrication. We present dark-field digital holographic microscopy that addresses various overlay metrology challenges that are encountered in the semiconductor industry. We present measurement results that show that the point-spread function of our microscope depends on the position in the field-of-view. We will show that this novel observation can be explained by a combination of the finite bandwidth of the light source and a wavelength-dependent focal length of the imaging lens. Moreover, we will also present additional experimental data that supports our theoretical understanding. Finally, we will propose solutions that reduce this effect to acceptable levels.
ABSTRACT
The complete characterization of spatial coherence is extremely difficult because the mutual coherence function (MCF) is a complex-valued function of four independent Cartesian coordinates. This difficulty limits the ability to control and to optimize the spatial coherence in a broad range of key applications. Here we propose an efficient and robust scheme for measuring the complete MCF of an arbitrary partially coherent beam using self-referencing holography, which does not require any prior knowledge or making any assumptions about the MCF. We further apply our method to lensless diffractive imaging, and experimentally demonstrate the reconstruction of a phase object under spatially partially coherent illumination. This application is particularly useful for imaging at short wavelengths, where the illumination sources lack spatial coherence and no high-quality imaging optics are available.