RESUMO
Extending the fabrication methodology of solid-state nanopores in a wide range of materials is significant in the fields of single molecule detection, nanofluidic devices, and nanofiltration membranes. Here, we demonstrate a new method to directly fabricate size- and density-controllable sub-10 nm nanopores in WO3 nanosheets using single swift heavy ions (SHIs) without any chemical etching process. By selecting ions of different electronic energy losses (Se), nanopores with sizes from 1.8 to 7.4 nm can be created in WO3 nanosheets. The creation efficiency of nanopores achieves â¼100% for Se > 20 keV/nm, and there exists a critical thickness below which nanopores can be created. Combined with molecular dynamics simulations, we propose that the viscosity and surface tension of the transient molten phase caused by SHIs are the key factors for the formation of nanopores. This method paves a way to fabricate solid-state nanopores in materials with a low viscosity and surface tension.
RESUMO
Porous architectures based on graphene oxide with precisely tailored nm-sized pores are attractive for biofluidic applications such as molecular sieving, DNA sequencing, and recognition-based sensing. However, the existing pore fabrication methods are complex, suffer from insufficient control over the pore density and uniformity, or are not scalable to large areas. Notably, creating vertical pores in multilayer films appears to be particularly difficult. Here, we show that uniform 6-7 nm-sized holes and straight, vertical nanochannels can be formed by simply irradiating graphene oxide (GO) films with high-energy heavy ions. Long penetration depths of energetic ions in combination with localized energy deposition and effective self-etching processes enable the creation of through pores even in 10 µm-thick GO films. This fully scalable fabrication provides a promising possibility for obtaining innovative GO track membranes.