Atomic layer deposition of aluminum oxide films for carbon nanotube network transistor passivation.

Grigoras, Kestutis; Zavodchikova, Marina Y; Nasibulin, Albert G; Kauppinen, Esko I; Ermolov, Vladimir; Franssila, Sami

Grigoras, Kestutis; Zavodchikova, Marina Y; Nasibulin, Albert G; Kauppinen, Esko I; Ermolov, Vladimir; Franssila, Sami.

Affiliation

Grigoras K; Department of Micro and Nanosciences, Aalto University School of Science and Technology, P O. Box 13500, Fl-00076 Aalto, Finland.

J Nanosci Nanotechnol ; 11(10): 8818-25, 2011 Oct.

Article in En | MEDLINE | ID: mdl-22400265

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Collection: 01-internacional Database: MEDLINE Language: En Journal: J Nanosci Nanotechnol Year: 2011 Type: Article Affiliation country: Finland

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Collection: 01-internacional Database: MEDLINE Language: En Journal: J Nanosci Nanotechnol Year: 2011 Type: Article Affiliation country: Finland