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Reaction Mechanism and Selectivity Control of Si Compound ALE Based on Plasma Modification and F-Radical Exposure.
Vervuurt, R H J; Mukherjee, B; Nakane, K; Tsutsumi, T; Hori, M; Kobayashi, N.
Affiliation
  • Vervuurt RHJ; ASM Belgium, Kapeldreef 75, 3000 Leuven, Belgium.
  • Mukherjee B; ASM Japan K.K., 23-1, 6-chome Nagayama, Tama, Tokyo 206-0025, Japan.
  • Nakane K; Nagoya University, Furo-cho, Chikusa-ku, Nagoya, Aichi 464-8603, Japan.
  • Tsutsumi T; Nagoya University, Furo-cho, Chikusa-ku, Nagoya, Aichi 464-8603, Japan.
  • Hori M; Nagoya University, Furo-cho, Chikusa-ku, Nagoya, Aichi 464-8603, Japan.
  • Kobayashi N; Nagoya University, Furo-cho, Chikusa-ku, Nagoya, Aichi 464-8603, Japan.
Langmuir ; 37(43): 12663-12672, 2021 Nov 02.
Article in En | MEDLINE | ID: mdl-34666489
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Full text: 1 Collection: 01-internacional Database: MEDLINE Language: En Journal: Langmuir Journal subject: QUIMICA Year: 2021 Type: Article Affiliation country: Belgium
Fulltext
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PubMed Links
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Full text: 1 Collection: 01-internacional Database: MEDLINE Language: En Journal: Langmuir Journal subject: QUIMICA Year: 2021 Type: Article Affiliation country: Belgium