Polymeric lithography editor: Editing lithographic errors with nanoporous polymeric probes.

Rajasekaran, Pradeep Ramiah; Zhou, Chuanhong; Dasari, Mallika; Voss, Kay-Obbe; Trautmann, Christina; Kohli, Punit

Rajasekaran, Pradeep Ramiah; Zhou, Chuanhong; Dasari, Mallika; Voss, Kay-Obbe; Trautmann, Christina; Kohli, Punit.

Afiliación

Rajasekaran PR; Department of Chemistry and Biochemistry, Southern Illinois University, Carbondale, IL 62901, USA.
Zhou C; Department of Chemistry and Biochemistry, Southern Illinois University, Carbondale, IL 62901, USA.
Dasari M; Department of Chemistry and Biochemistry, Southern Illinois University, Carbondale, IL 62901, USA.
Voss KO; GSI Helmholtzzentrum, 64291 Darmstadt, Germany.
Trautmann C; GSI Helmholtzzentrum, 64291 Darmstadt, Germany.
Kohli P; Technische Universität, 64289 Darmstadt, Germany.

Sci Adv ; 3(6): e1602071, 2017 06.

Article en En | MEDLINE | ID: mdl-28630898

Asunto(s)

Modelos Teóricos; Polímeros/química; Algoritmos; Hidrogeles/química; Nanoporos/ultraestructura

Palabras clave

DEVICE FABRICATION; ERASING; MOLECULAR EDITING USING LITHOGRAPHY; PATTERNING; POLYMER ERASER

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Texto completo: 1 Colección: 01-internacional Banco de datos: MEDLINE Asunto principal: Polímeros / Modelos Teóricos Idioma: En Revista: Sci Adv Año: 2017 Tipo del documento: Article País de afiliación: Estados Unidos

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