Modeling UV-C irradiation chambers for mask decontamination using Zemax OpticStudio.
Appl Opt
; 59(25): 7596-7605, 2020 Sep 01.
Article
en En
| MEDLINE
| ID: mdl-32902459
ABSTRACT
Ultraviolet decontamination of personal protective equipment, particularly masks, is important in situations where mask reuse is practiced. To assist in the development of UV-C decontamination chambers, we have constructed ray tracing models in Zemax OpticStudio v20.1 for two distinct geometries, namely, a rectangular cabinet and a cylindrical can. These models provide irradiance distributions that can be used for comparison with experiment, as well as to predict local irradiance variation over the surface of a mask. In this paper we describe the model details, including (1) a mask object in CAD format; (2) our assumptions for modeling surface properties; (3) the use of polygon object detectors for local irradiance analysis; and (4) experimental results that compare favorably to the simulations.
Texto completo:
1
Colección:
01-internacional
Banco de datos:
MEDLINE
Tipo de estudio:
Prognostic_studies
Idioma:
En
Revista:
Appl Opt
Año:
2020
Tipo del documento:
Article