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Back-Gate GaN Nanowire-Based FET Device for Enhancing Gas Selectivity at Room Temperature.
Khan, Md Ashfaque Hossain; Debnath, Ratan; Motayed, Abhishek; Rao, Mulpuri V.
Afiliación
  • Khan MAH; Department of Electrical and Computer Engineering, George Mason University, Fairfax, VA 22030, USA.
  • Debnath R; N5 Sensors, Inc., Rockville, MD 20850, USA.
  • Motayed A; N5 Sensors, Inc., Rockville, MD 20850, USA.
  • Rao MV; Department of Electrical and Computer Engineering, George Mason University, Fairfax, VA 22030, USA.
Sensors (Basel) ; 21(2)2021 Jan 17.
Article en En | MEDLINE | ID: mdl-33477377
In this work, a TiO2-coated GaN nanowire-based back-gate field-effect transistor (FET) device was designed and implemented to address the well-known cross-sensitive nature of metal oxides. Even though a two-terminal TiO2/GaN chemiresistor is highly sensitive to NO2, it suffers from lack of selectivity toward NO2 and SO2. Here, a Si back gate with C-AlGaN as the gate dielectric was demonstrated as a tunable parameter, which enhances discrimination of these cross-sensitive gases at room temperature (20 °C). Compared to no bias, a back-gate bias resulted in a significant 60% increase in NO2 response, whereas the increase was an insignificant 10% in SO2 response. The differential change in gas response was explained with the help of a band diagram, derived from the energetics of molecular models based on density functional theory (DFT). The device geometries in this work are not optimized and are intended only for proving the concept.
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Texto completo: 1 Colección: 01-internacional Banco de datos: MEDLINE Idioma: En Revista: Sensors (Basel) Año: 2021 Tipo del documento: Article País de afiliación: Estados Unidos

Texto completo: 1 Colección: 01-internacional Banco de datos: MEDLINE Idioma: En Revista: Sensors (Basel) Año: 2021 Tipo del documento: Article País de afiliación: Estados Unidos