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High quality AlN film assisted by graphene/sputtered AlN buffer layer for deep-ultraviolet-LED.
Wu, Haidi; Ning, Jing; Zhang, Jincheng; Zeng, Yu; Jia, Yanqing; Zhao, Jianglin; Bai, Ling; Wang, Yanbo; Li, Shiyu; Wang, Dong; Hao, Yue.
Afiliación
  • Wu H; The State Key Discipline Laboratory of Wide Band Gap Semiconductor Technology, Xidian University, Xi'an 710071, People's Republic of China.
  • Ning J; Shaanxi Joint Key Laboratory of Graphene, Xidian University, Xi'an 710071, People's Republic of China.
  • Zhang J; The State Key Discipline Laboratory of Wide Band Gap Semiconductor Technology, Xidian University, Xi'an 710071, People's Republic of China.
  • Zeng Y; Shaanxi Joint Key Laboratory of Graphene, Xidian University, Xi'an 710071, People's Republic of China.
  • Jia Y; The State Key Discipline Laboratory of Wide Band Gap Semiconductor Technology, Xidian University, Xi'an 710071, People's Republic of China.
  • Zhao J; Shaanxi Joint Key Laboratory of Graphene, Xidian University, Xi'an 710071, People's Republic of China.
  • Bai L; The State Key Discipline Laboratory of Wide Band Gap Semiconductor Technology, Xidian University, Xi'an 710071, People's Republic of China.
  • Wang Y; Shaanxi Joint Key Laboratory of Graphene, Xidian University, Xi'an 710071, People's Republic of China.
  • Li S; The State Key Discipline Laboratory of Wide Band Gap Semiconductor Technology, Xidian University, Xi'an 710071, People's Republic of China.
  • Wang D; Shaanxi Joint Key Laboratory of Graphene, Xidian University, Xi'an 710071, People's Republic of China.
  • Hao Y; The State Key Discipline Laboratory of Wide Band Gap Semiconductor Technology, Xidian University, Xi'an 710071, People's Republic of China.
Nanotechnology ; 34(29)2023 May 09.
Article en En | MEDLINE | ID: mdl-37044083
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Texto completo: 1 Colección: 01-internacional Banco de datos: MEDLINE Idioma: En Revista: Nanotechnology Año: 2023 Tipo del documento: Article
Texto completo
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PubMed Links
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Texto completo: 1 Colección: 01-internacional Banco de datos: MEDLINE Idioma: En Revista: Nanotechnology Año: 2023 Tipo del documento: Article