Optically defined multifunctional patterning of photosensitive thin-film silica mesophases.
Science
; 290(5489): 107-11, 2000 Oct 06.
Article
em En
| MEDLINE
| ID: mdl-11021789
ABSTRACT
Photosensitive films incorporating molecular photoacid generators compartmentalized within a silica-surfactant mesophase were prepared by an evaporation-induced self-assembly process. Ultraviolet exposure promoted localized acid-catalyzed siloxane condensation, which can be used for selective etching of unexposed regions; for "gray-scale" patterning of refractive index, pore size, surface area, and wetting behavior; and for optically defining a mesophase transformation (from hexagonal to tetragonal) within the film. The ability to optically define and continuously control both structure and function on the macro- and mesoscales is of interest for sensor arrays, nanoreactors, photonic and fluidic devices, and low-dielectric-constant films.
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Coleções:
01-internacional
Base de dados:
MEDLINE
Idioma:
En
Revista:
Science
Ano de publicação:
2000
Tipo de documento:
Article
País de afiliação:
Estados Unidos