Development of broadband X-ray interference lithography large area exposure system.

Xue, Chaofan; Wu, Yanqing; Zhu, Fangyuan; Yang, Shumin; Liu, Haigang; Zhao, Jun; Wang, Liansheng; Tai, Renzhong

Xue, Chaofan; Wu, Yanqing; Zhu, Fangyuan; Yang, Shumin; Liu, Haigang; Zhao, Jun; Wang, Liansheng; Tai, Renzhong.

Afiliação

Xue C; Shanghai Institute of Applied Physics, Shanghai Synchrotron Radiation Facility, Chinese Academy of Sciences, Shanghai 201800, People's Republic of China.
Wu Y; Shanghai Institute of Applied Physics, Shanghai Synchrotron Radiation Facility, Chinese Academy of Sciences, Shanghai 201800, People's Republic of China.
Zhu F; Shanghai Institute of Applied Physics, Shanghai Synchrotron Radiation Facility, Chinese Academy of Sciences, Shanghai 201800, People's Republic of China.
Yang S; Shanghai Institute of Applied Physics, Shanghai Synchrotron Radiation Facility, Chinese Academy of Sciences, Shanghai 201800, People's Republic of China.
Liu H; Shanghai Institute of Applied Physics, Shanghai Synchrotron Radiation Facility, Chinese Academy of Sciences, Shanghai 201800, People's Republic of China.
Zhao J; Shanghai Institute of Applied Physics, Shanghai Synchrotron Radiation Facility, Chinese Academy of Sciences, Shanghai 201800, People's Republic of China.
Wang L; Shanghai Institute of Applied Physics, Shanghai Synchrotron Radiation Facility, Chinese Academy of Sciences, Shanghai 201800, People's Republic of China.
Tai R; Shanghai Institute of Applied Physics, Shanghai Synchrotron Radiation Facility, Chinese Academy of Sciences, Shanghai 201800, People's Republic of China.

Rev Sci Instrum ; 87(4): 043303, 2016 04.

Article em En | MEDLINE | ID: mdl-27131667

Texto completo

Imprimir

XML

PubMed Links

Buscar no Google

Texto completo: 1 Coleções: 01-internacional Base de dados: MEDLINE Tipo de estudo: Clinical_trials Idioma: En Revista: Rev Sci Instrum Ano de publicação: 2016 Tipo de documento: Article

Texto completo

Imprimir

XML

PubMed Links

Buscar no Google