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Patterning technology for solution-processed organic crystal field-effect transistors.
Li, Yun; Sun, Huabin; Shi, Yi; Tsukagoshi, Kazuhito.
Afiliação
  • Li Y; School of Electronic Science and Engineering and Jiangsu Provincial Key Laboratory of Photonic and Electronic Materials, Nanjing University, Nanjing, 210093, People's Republic of China; International Center for Materials Nanoarchitectronics(WPI-MANA), National Institute for Materials Science (NIMS),
  • Sun H; School of Electronic Science and Engineering and Jiangsu Provincial Key Laboratory of Photonic and Electronic Materials, Nanjing University, Nanjing, 210093, People's Republic of China.
  • Shi Y; School of Electronic Science and Engineering and Jiangsu Provincial Key Laboratory of Photonic and Electronic Materials, Nanjing University, Nanjing, 210093, People's Republic of China.
  • Tsukagoshi K; International Center for Materials Nanoarchitectronics(WPI-MANA), National Institute for Materials Science (NIMS), 1-1 Namiki, Tsukuba, Ibaraki, 305-0044, Japan.
Sci Technol Adv Mater ; 15(2): 024203, 2014 Apr.
Article em En | MEDLINE | ID: mdl-27877656
ABSTRACT
Organic field-effect transistors (OFETs) are fundamental building blocks for various state-of-the-art electronic devices. Solution-processed organic crystals are appreciable materials for these applications because they facilitate large-scale, low-cost fabrication of devices with high performance. Patterning organic crystal transistors into well-defined geometric features is necessary to develop these crystals into practical semiconductors. This review provides an update on recentdevelopment in patterning technology for solution-processed organic crystals and their applications in field-effect transistors. Typical demonstrations are discussed and examined. In particular, our latest research progress on the spin-coating technique from mixture solutions is presented as a promising method to efficiently produce large organic semiconducting crystals on various substrates for high-performance OFETs. This solution-based process also has other excellent advantages, such as phase separation for self-assembled interfaces via one-step spin-coating, self-flattening of rough interfaces, and in situ purification that eliminates the impurity influences. Furthermore, recommendations for future perspectives are presented, and key issues for further development are discussed.
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Texto completo: 1 Coleções: 01-internacional Base de dados: MEDLINE Tipo de estudo: Guideline Idioma: En Revista: Sci Technol Adv Mater Ano de publicação: 2014 Tipo de documento: Article

Texto completo: 1 Coleções: 01-internacional Base de dados: MEDLINE Tipo de estudo: Guideline Idioma: En Revista: Sci Technol Adv Mater Ano de publicação: 2014 Tipo de documento: Article