Low temperature growth of fully covered single-layer graphene using a CoCu catalyst.

Sugime, Hisashi; D'Arsié, Lorenzo; Esconjauregui, Santiago; Zhong, Guofang; Wu, Xingyi; Hildebrandt, Eugen; Sezen, Hikmet; Amati, Matteo; Gregoratti, Luca; Weatherup, Robert S; Robertson, John

Sugime, Hisashi; D'Arsié, Lorenzo; Esconjauregui, Santiago; Zhong, Guofang; Wu, Xingyi; Hildebrandt, Eugen; Sezen, Hikmet; Amati, Matteo; Gregoratti, Luca; Weatherup, Robert S; Robertson, John.

Afiliação

Sugime H; Waseda Institute for Advanced Study, Waseda University, Tokyo 169-8050, Japan. sugime@aoni.waseda.jp and Department of Engineering, University of Cambridge, Cambridge CB3 0FA, UK.
D'Arsié L; Department of Engineering, University of Cambridge, Cambridge CB3 0FA, UK.
Esconjauregui S; Department of Engineering, University of Cambridge, Cambridge CB3 0FA, UK.
Zhong G; Department of Engineering, University of Cambridge, Cambridge CB3 0FA, UK.
Wu X; Department of Engineering, University of Cambridge, Cambridge CB3 0FA, UK.
Hildebrandt E; Department of Engineering, University of Cambridge, Cambridge CB3 0FA, UK.
Sezen H; Elettra-Sincrotrone Trieste S.C.p.A., AREA Science Park, S.S. 14 km 163.5, 34149, Trieste, Italy.
Amati M; Elettra-Sincrotrone Trieste S.C.p.A., AREA Science Park, S.S. 14 km 163.5, 34149, Trieste, Italy.
Gregoratti L; Elettra-Sincrotrone Trieste S.C.p.A., AREA Science Park, S.S. 14 km 163.5, 34149, Trieste, Italy.
Weatherup RS; Department of Engineering, University of Cambridge, Cambridge CB3 0FA, UK.
Robertson J; Department of Engineering, University of Cambridge, Cambridge CB3 0FA, UK.

Nanoscale ; 9(38): 14467-14475, 2017 Oct 05.

Article em En | MEDLINE | ID: mdl-28926077

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Texto completo: 1 Coleções: 01-internacional Base de dados: MEDLINE Idioma: En Revista: Nanoscale Ano de publicação: 2017 Tipo de documento: Article País de afiliação: Reino Unido

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