The Extremely Enhanced Photocurrent Response in Topological Insulator Nanosheets with High Conductance.

Huang, Shiu-Ming; Lin, Lin-Jie; Yan, You-Jhih; Yu, Shih-Hsun; Chou, Mitch M C; Hsieh, Ho-Feng; Ho, Chin-Jung; Chen, Ruei-San

Huang, Shiu-Ming; Lin, Lin-Jie; Yan, You-Jhih; Yu, Shih-Hsun; Chou, Mitch M C; Hsieh, Ho-Feng; Ho, Chin-Jung; Chen, Ruei-San.

Afiliação

Huang SM; Department of Physics, National Sun Yat-Sen University, Kaohsiung, 80424, Taiwan. smhuang@mail.nsysu.edu.tw.
Lin LJ; Department of Physics, National Sun Yat-Sen University, Kaohsiung, 80424, Taiwan.
Yan YJ; Department of Materials and Optoelectronic Science, National Sun Yat-Sen University, Kaohsiung, 80424, Taiwan.
Yu SH; Department of Materials and Optoelectronic Science, National Sun Yat-Sen University, Kaohsiung, 80424, Taiwan.
Chou MMC; Department of Materials and Optoelectronic Science, National Sun Yat-Sen University, Kaohsiung, 80424, Taiwan.
Hsieh HF; Center of Crystal Research, National Sun Yat-sen University, Kaohsiung, 80424, Taiwan.
Ho CJ; Graduate Institute of Applied Science and Technology, National Taiwan University of Science and Technology, Taipei, 10607, Taiwan.
Chen RS; Graduate Institute of Applied Science and Technology, National Taiwan University of Science and Technology, Taipei, 10607, Taiwan.

Nanoscale Res Lett ; 13(1): 371, 2018 Nov 21.

Article em En | MEDLINE | ID: mdl-30465297

Palavras-chave

Nanosheets; Photoresponse; Topological insulator

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Texto completo: 1 Coleções: 01-internacional Base de dados: MEDLINE Idioma: En Revista: Nanoscale Res Lett Ano de publicação: 2018 Tipo de documento: Article País de afiliação: Taiwan

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