Metallic filamentary conduction in valence change-based resistive switching devices: the case of TaO<sub>x</sub> thin film with xâ¼ 1.

Rosário, Carlos M M; Thöner, Bo; Schönhals, Alexander; Menzel, Stephan; Meledin, Alexander; Barradas, Nuno P; Alves, Eduardo; Mayer, Joachim; Wuttig, Matthias; Waser, Rainer; Sobolev, Nikolai A; Wouters, Dirk J

Metallic filamentary conduction in valence change-based resistive switching devices: the case of TaO_x thin film with xâ¼ 1.

Rosário, Carlos M M; Thöner, Bo; Schönhals, Alexander; Menzel, Stephan; Meledin, Alexander; Barradas, Nuno P; Alves, Eduardo; Mayer, Joachim; Wuttig, Matthias; Waser, Rainer; Sobolev, Nikolai A; Wouters, Dirk J.

Afiliação

Rosário CMM; Physics Department and I3N, University of Aveiro, Aveiro, 3810-193, Portugal. cmiguelrosario@ua.pt and Institut für Werkstoffe der Elektrotechnik II, RWTH Aachen University, Aachen, 52074, Germany.
Thöner B; I. Physikalisches Institut IA, RWTH Aachen University, Aachen, 52074, Germany.
Schönhals A; Institut für Werkstoffe der Elektrotechnik II, RWTH Aachen University, Aachen, 52074, Germany.
Menzel S; Peter Grünberg Institute and JARA-FIT, Forschungszentrum Jülich GmbH, Jülich, 52428, Germany.
Meledin A; Central Facility for Electron Microscopy, RWTH Aachen University, 52074 Aachen, Germany and Ernst Ruska-Centre for Microscopy and Spectroscopy with Electrons (ER-C), Forschungszentrum Jülich GmbH, 52428 Jülich, Germany.
Barradas NP; Centro de Ciências e Tecnologias Nucleares, Instituto Superior Técnico, Universidade de Lisboa, Bobadela, 2695-066, Portugal.
Alves E; Instituto de Plasmas e Fusão Nuclear and Laboratório de Aceleradores e Tecnologias de Radiação, Instituto Superior Técnico, Universidade de Lisboa, Bobadela, 2695-066, Portugal.
Mayer J; Central Facility for Electron Microscopy, RWTH Aachen University, 52074 Aachen, Germany and Ernst Ruska-Centre for Microscopy and Spectroscopy with Electrons (ER-C), Forschungszentrum Jülich GmbH, 52428 Jülich, Germany.
Wuttig M; I. Physikalisches Institut IA, RWTH Aachen University, Aachen, 52074, Germany and Peter Grünberg Institute and JARA-FIT, Forschungszentrum Jülich GmbH, Jülich, 52428, Germany.
Waser R; Institut für Werkstoffe der Elektrotechnik II, RWTH Aachen University, Aachen, 52074, Germany and Peter Grünberg Institute and JARA-FIT, Forschungszentrum Jülich GmbH, Jülich, 52428, Germany.
Sobolev NA; Physics Department and I3N, University of Aveiro, Aveiro, 3810-193, Portugal. cmiguelrosario@ua.pt and National University of Science and Technology MISiS, 119049 Moscow, Russia.
Wouters DJ; Institut für Werkstoffe der Elektrotechnik II, RWTH Aachen University, Aachen, 52074, Germany.

Nanoscale ; 11(36): 16978-16990, 2019 Sep 28.

Article em En | MEDLINE | ID: mdl-31498350

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Texto completo: 1 Coleções: 01-internacional Base de dados: MEDLINE Tipo de estudo: Prognostic_studies Idioma: En Revista: Nanoscale Ano de publicação: 2019 Tipo de documento: Article País de afiliação: Alemanha

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