Direct Epitaxial Growth of Polar (1 - x)HfO2-(x)ZrO2 Ultrathin Films on Silicon.

Nukala, Pavan; Antoja-Lleonart, Jordi; Wei, Yingfen; Yedra, Lluis; Dkhil, Brahim; Noheda, Beatriz

Direct Epitaxial Growth of Polar (1 - x)HfO₂-(x)ZrO₂ Ultrathin Films on Silicon.

Nukala, Pavan; Antoja-Lleonart, Jordi; Wei, Yingfen; Yedra, Lluis; Dkhil, Brahim; Noheda, Beatriz.

Afiliação

Nukala P; Zernike Institute of Advanced Materials, University of Groningen, Groningen 9747 AG, The Netherlands.
Antoja-Lleonart J; Zernike Institute of Advanced Materials, University of Groningen, Groningen 9747 AG, The Netherlands.
Wei Y; Zernike Institute of Advanced Materials, University of Groningen, Groningen 9747 AG, The Netherlands.
Yedra L; Laboratoire Structures, Propriétés et Modélisation des Solides, CentraleSupélec, CNRS UMR 8580, Université Paris-Saclay, 91190 Gif-sur-Yvette, France.
Dkhil B; Laboratoire Mécanique des Sols, Structures et Matériaux, CentraleSupélec, CNRS UMR 8579, Université Paris-Saclay, 91190 Gif-sur-Yvette, France.
Noheda B; Laboratoire Structures, Propriétés et Modélisation des Solides, CentraleSupélec, CNRS UMR 8580, Université Paris-Saclay, 91190 Gif-sur-Yvette, France.

ACS Appl Electron Mater ; 1(12): 2585-2593, 2019 Dec 24.

Article em En | MEDLINE | ID: mdl-32954356

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Texto completo: 1 Coleções: 01-internacional Base de dados: MEDLINE Idioma: En Revista: ACS Appl Electron Mater Ano de publicação: 2019 Tipo de documento: Article País de afiliação: Holanda

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