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Band gap measurement by nano-beam STEM with small off-axis angle transmission electron energy loss spectroscopy (TEELS).
Wang, Yun-Yu; Jin, Qiang; Zhuang, Kent; Choi, Jae Kyu; Nxumalo, Jochonia.
Afiliação
  • Wang YY; Micron Technology, 8000 S. Federal Way, Boise, ID 83716, USA. Electronic address: Yunyuwang@micron.com.
  • Jin Q; Micron Technology, 8000 S. Federal Way, Boise, ID 83716, USA.
  • Zhuang K; Micron Technology, 8000 S. Federal Way, Boise, ID 83716, USA.
  • Choi JK; Micron Technology, 8000 S. Federal Way, Boise, ID 83716, USA.
  • Nxumalo J; Micron Technology, 8000 S. Federal Way, Boise, ID 83716, USA.
Ultramicroscopy ; 220: 113164, 2021 Jan.
Article em En | MEDLINE | ID: mdl-33186852
ABSTRACT
An energy band gap measurement method based on nano-beam STEM with small off-axis angle valence band transmission electron energy loss spectroscopy (TEELS) is reported. The effect of multiple scattering event is removed by self-convolution method to obtain a single scattering loss function and a dielectric function is calculated from the single scattering valence band energy loss function through Kramers-Kronig (K-K) analysis. Optical band gaps are extracted from energy loss spectra and the imaginary part of the dielectric functions for crystalline and amorphous SiOx, SiNx, and SiON through linear fitting of on-set regions yielding results that are independent of sample thickness. The TEELS band gap data are consistent with those obtained from reflection electron energy loss spectroscopy (REELS) measurements.
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Texto completo: 1 Coleções: 01-internacional Base de dados: MEDLINE Idioma: En Revista: Ultramicroscopy Ano de publicação: 2021 Tipo de documento: Article

Texto completo: 1 Coleções: 01-internacional Base de dados: MEDLINE Idioma: En Revista: Ultramicroscopy Ano de publicação: 2021 Tipo de documento: Article