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Epitaxial Ferroelectric Hf0.5 Zr0.5 O2 with Metallic Pyrochlore Oxide Electrodes.
Zhang, Zimeng; Hsu, Shang-Lin; Stoica, Vladimir A; Paik, Hanjong; Parsonnet, Eric; Qualls, Alexander; Wang, Jianjun; Xie, Liang; Kumari, Mukesh; Das, Sujit; Leng, Zhinan; McBriarty, Martin; Proksch, Roger; Gruverman, Alexei; Schlom, Darrell G; Chen, Long-Qing; Salahuddin, Sayeef; Martin, Lane W; Ramesh, Ramamoorthy.
Afiliação
  • Zhang Z; Department of Materials Science and Engineering, University of California, Berkeley, CA, 94720, USA.
  • Hsu SL; National Center for Electron Microscopy, Molecular Foundry, Lawrence Berkeley National Laboratory, Berkeley, CA, 94720, USA.
  • Stoica VA; Department of Electrical Engineering and Computer Sciences, University of California, Berkeley, CA, 94720, USA.
  • Paik H; Advanced Photon Source, Argonne National Laboratory, Lemont, IL, 60439, USA.
  • Parsonnet E; Platform for the Accelerated Realization, Analysis, and Discovery of Interface Materials (PARADIM), Cornell University, Ithaca, NY, 14853, USA.
  • Qualls A; Department of Materials Science and Engineering, Cornell University, Ithaca, NY, 14853, USA.
  • Wang J; Department of Physics, University of California, Berkeley, CA, 94720, USA.
  • Xie L; Department of Physics, University of California, Berkeley, CA, 94720, USA.
  • Kumari M; Department of Materials Science and Engineering, Penn State University, University Park, Pennsylvania, 16802, USA.
  • Das S; Department of Materials Science and Engineering, University of California, Berkeley, CA, 94720, USA.
  • Leng Z; Department of Materials Science and Engineering, University of California, Berkeley, CA, 94720, USA.
  • McBriarty M; Department of Materials Science and Engineering, University of California, Berkeley, CA, 94720, USA.
  • Proksch R; Department of Materials Science and Engineering, University of California, Berkeley, CA, 94720, USA.
  • Gruverman A; EMD Performance Materials, San Jose, CA, 95134, USA.
  • Schlom DG; Asylum Research, Goleta, CA, 93117, USA.
  • Chen LQ; Department of Physics, University of Nebraska, Lincoln, NE, 68588-0299, USA.
  • Salahuddin S; Platform for the Accelerated Realization, Analysis, and Discovery of Interface Materials (PARADIM), Cornell University, Ithaca, NY, 14853, USA.
  • Martin LW; Department of Materials Science and Engineering, Cornell University, Ithaca, NY, 14853, USA.
  • Ramesh R; Kavli Institute at Cornell for Nanoscale Science, Ithaca, NY, 14853, USA.
Adv Mater ; 33(10): e2006089, 2021 Mar.
Article em En | MEDLINE | ID: mdl-33533113
ABSTRACT
The synthesis of fully epitaxial ferroelectric Hf0.5 Zr0.5 O2 (HZO) thin films through the use of a conducting pyrochlore oxide electrode that acts as a structural and chemical template is reported. Such pyrochlores, exemplified by Pb2 Ir2 O7 (PIO) and Bi2 Ru2 O7 (BRO), exhibit metallic conductivity with room-temperature resistivity of <1 mΩ cm and are closely lattice matched to yttria-stabilized zirconia substrates as well as the HZO layers grown on top of them. Evidence for epitaxy and domain formation is established with X-ray diffraction and scanning transmission electron microscopy, which show that the c-axis of the HZO film is normal to the substrate surface. The emergence of the non-polar-monoclinic phase from the polar-orthorhombic phase is observed when the HZO film thickness is ≥≈30 nm. Thermodynamic analyses reveal the role of epitaxial strain and surface energy in stabilizing the polar phase as well as its coexistence with the non-polar-monoclinic phase as a function of film thickness.
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Texto completo: 1 Coleções: 01-internacional Base de dados: MEDLINE Idioma: En Revista: Adv Mater Assunto da revista: BIOFISICA / QUIMICA Ano de publicação: 2021 Tipo de documento: Article País de afiliação: Estados Unidos
Texto completo
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Texto completo: 1 Coleções: 01-internacional Base de dados: MEDLINE Idioma: En Revista: Adv Mater Assunto da revista: BIOFISICA / QUIMICA Ano de publicação: 2021 Tipo de documento: Article País de afiliação: Estados Unidos