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Defect-Free Axially Stacked GaAs/GaAsP Nanowire Quantum Dots with Strong Carrier Confinement.
Zhang, Yunyan; Velichko, Anton V; Fonseka, H Aruni; Parkinson, Patrick; Gott, James A; Davis, George; Aagesen, Martin; Sanchez, Ana M; Mowbray, David; Liu, Huiyun.
Afiliação
  • Zhang Y; Department of Electronic and Electrical Engineering, University College London, London WC1E 7JE, United Kingdom.
  • Velichko AV; Department of Physics, Universität Paderborn, Warburger Straße 100, 33098 Paderborn, Germany.
  • Fonseka HA; Department of Physics and Astronomy, University of Sheffield, Sheffield S3 7RH, United Kingdom.
  • Parkinson P; Department of Physics, University of Warwick, Coventry CV4 7AL, United Kingdom.
  • Gott JA; School Department of Physics and Astronomy and the Photon Science Institute, University of Manchester, Manchester M13 9PL, United Kingdom.
  • Davis G; Department of Physics, University of Warwick, Coventry CV4 7AL, United Kingdom.
  • Aagesen M; Department of Physics and Astronomy, University of Sheffield, Sheffield S3 7RH, United Kingdom.
  • Sanchez AM; Center for Quantum Devices, Niels Bohr Institute, University of Copenhagen, Universitetsparken 5, 2100 Copenhagen, Denmark.
  • Mowbray D; Department of Physics, University of Warwick, Coventry CV4 7AL, United Kingdom.
  • Liu H; Department of Physics and Astronomy, University of Sheffield, Sheffield S3 7RH, United Kingdom.
Nano Lett ; 21(13): 5722-5729, 2021 Jul 14.
Article em En | MEDLINE | ID: mdl-34181433
ABSTRACT
Axially stacked quantum dots (QDs) in nanowires (NWs) have important applications in nanoscale quantum devices and lasers. However, there is lack of study of defect-free growth and structure optimization using the Au-free growth mode. We report a detailed study of self-catalyzed GaAsP NWs containing defect-free axial GaAs QDs (NWQDs). Sharp interfaces (1.8-3.6 nm) allow closely stack QDs with very similar structural properties. High structural quality is maintained when up to 50 GaAs QDs are placed in a single NW. The QDs maintain an emission line width of <10 meV at 140 K (comparable to the best III-V QDs, including nitrides) after having been stored in an ambient atmosphere for over 6 months and exhibit deep carrier confinement (∼90 meV) and the largest reported exciton-biexciton splitting (∼11 meV) for non-nitride III-V NWQDs. Our study provides a solid foundation to build high-performance axially stacked NWQD devices that are compatible with CMOS technologies.
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Texto completo: 1 Coleções: 01-internacional Base de dados: MEDLINE Idioma: En Revista: Nano Lett Ano de publicação: 2021 Tipo de documento: Article País de afiliação: Reino Unido

Texto completo: 1 Coleções: 01-internacional Base de dados: MEDLINE Idioma: En Revista: Nano Lett Ano de publicação: 2021 Tipo de documento: Article País de afiliação: Reino Unido