Surfing Scanning Probe Nanolithography at Meters Per Second.
Nano Lett
; 22(6): 2187-2193, 2022 03 23.
Article
em En
| MEDLINE
| ID: mdl-35025518
ABSTRACT
Scanning probe lithography (SPL) as a maskless approach with a low tool price can pattern a variety of materials at a nanometer or even atomic resolution. However, the throughput of conventional SPLs is extremely low due to their limited scanning speeds. Here, we report a high-speed, probe-based method to continuously pattern the substrate surface at a linear velocity of meters per second. We demonstrated direct writings of nanoscale patterns by using ultrafast electron-induced deposition inside a nanoscale flow at a patterning frequency of 20 MHz. The fast scan motion of the writing probe is precisely controlled by using self-adaptive hydro- and aerodynamics functions of a patterning head. The microscale electro-hydrodynamic ejection and microfluid channels are used to deliver the precursor at high scanning speeds. One patterning head can carry parallel probes to further enhance the patterning throughput. This low-cost, maskless patterning method opens new avenues to develop high-throughput nanomanufacturing techniques.
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Texto completo:
1
Coleções:
01-internacional
Base de dados:
MEDLINE
Assunto principal:
Impressão
/
Nanotecnologia
Idioma:
En
Revista:
Nano Lett
Ano de publicação:
2022
Tipo de documento:
Article
País de afiliação:
Estados Unidos