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Fully in situ Nb/InAs-nanowire Josephson junctions by selective-area growth and shadow evaporation.
Perla, Pujitha; Fonseka, H Aruni; Zellekens, Patrick; Deacon, Russell; Han, Yisong; Kölzer, Jonas; Mörstedt, Timm; Bennemann, Benjamin; Espiari, Abbas; Ishibashi, Koji; Grützmacher, Detlev; Sanchez, Ana M; Lepsa, Mihail Ion; Schäpers, Thomas.
Afiliação
  • Perla P; Peter Grünberg Institut (PGI-9), Forschungszentrum Jülich 52425 Jülich Germany th.schaepers@fz-juelich.de +49 2461 61 2940 +49 2461 61 2668.
  • Fonseka HA; JARA-Fundamentals of Future Information Technology, Jülich-Aachen Research Alliance, Forschungszentrum Jülich, RWTH Aachen University Germany.
  • Zellekens P; Department of Physics, University of Warwick Coventry CV4 7AL UK.
  • Deacon R; Peter Grünberg Institut (PGI-9), Forschungszentrum Jülich 52425 Jülich Germany th.schaepers@fz-juelich.de +49 2461 61 2940 +49 2461 61 2668.
  • Han Y; JARA-Fundamentals of Future Information Technology, Jülich-Aachen Research Alliance, Forschungszentrum Jülich, RWTH Aachen University Germany.
  • Kölzer J; RIKEN Center for Emergent Matter Science and Advanced Device Laboratory 351-0198 Saitama Japan.
  • Mörstedt T; Department of Physics, University of Warwick Coventry CV4 7AL UK.
  • Bennemann B; Peter Grünberg Institut (PGI-9), Forschungszentrum Jülich 52425 Jülich Germany th.schaepers@fz-juelich.de +49 2461 61 2940 +49 2461 61 2668.
  • Espiari A; JARA-Fundamentals of Future Information Technology, Jülich-Aachen Research Alliance, Forschungszentrum Jülich, RWTH Aachen University Germany.
  • Ishibashi K; Peter Grünberg Institut (PGI-9), Forschungszentrum Jülich 52425 Jülich Germany th.schaepers@fz-juelich.de +49 2461 61 2940 +49 2461 61 2668.
  • Grützmacher D; JARA-Fundamentals of Future Information Technology, Jülich-Aachen Research Alliance, Forschungszentrum Jülich, RWTH Aachen University Germany.
  • Sanchez AM; Peter Grünberg Institut (PGI-9), Forschungszentrum Jülich 52425 Jülich Germany th.schaepers@fz-juelich.de +49 2461 61 2940 +49 2461 61 2668.
  • Lepsa MI; JARA-Fundamentals of Future Information Technology, Jülich-Aachen Research Alliance, Forschungszentrum Jülich, RWTH Aachen University Germany.
  • Schäpers T; Peter Grünberg Institut (PGI-9), Forschungszentrum Jülich 52425 Jülich Germany th.schaepers@fz-juelich.de +49 2461 61 2940 +49 2461 61 2668.
Nanoscale Adv ; 3(5): 1413-1421, 2021 Mar 09.
Article em En | MEDLINE | ID: mdl-36132855
ABSTRACT
Josephson junctions based on InAs semiconducting nanowires and Nb superconducting electrodes are fabricated in situ by a special shadow evaporation scheme for the superconductor electrode. Compared to other metallic superconductors such as Al, Nb has the advantage of a larger superconducting gap which allows operation at higher temperatures and magnetic fields. Our junctions are fabricated by shadow evaporation of Nb on pairs of InAs nanowires grown selectively on two adjacent tilted Si (111) facets and crossing each other at a small distance. The upper wire relative to the deposition source acts as a shadow mask determining the gap of the superconducting electrodes on the lower nanowire. Electron microscopy measurements show that the fully in situ fabrication method gives a clean InAs/Nb interface. A clear Josephson supercurrent is observed in the current-voltage characteristics, which can be controlled by a bottom gate. The large excess current indicates a high junction transparency. Under microwave radiation, pronounced integer Shapiro steps are observed suggesting a sinusoidal current-phase relation. Owing to the large critical field of Nb, the Josephson supercurrent can be maintained to magnetic fields exceeding 1 T. Our results show that in situ prepared Nb/InAs nanowire contacts are very interesting candidates for superconducting quantum circuits requiring large magnetic fields.

Texto completo: 1 Coleções: 01-internacional Base de dados: MEDLINE Idioma: En Revista: Nanoscale Adv Ano de publicação: 2021 Tipo de documento: Article

Texto completo: 1 Coleções: 01-internacional Base de dados: MEDLINE Idioma: En Revista: Nanoscale Adv Ano de publicação: 2021 Tipo de documento: Article