Significantly enhanced performance of InAs/GaAs quantum dot lasers on Si(001) via spatially separated co-doping.

We report the significantly enhanced performance of InAs/GaAs quantum dot (QD) lasers on Si(001) by spatially separated co-doping, including n-doping in the QDs and p-doping in the barrier layers simultaneously. The QD lasers are a ridge waveguide of 6 × 1000 µm2 containing five InAs QD layers. Compared with p-doped alone laser, the co-doped laser exhibits a large reduction in threshold current of 30.3% and an increase in maximum output power of 25.5% at room temperature. In the range of 15°C-115°C (under 1% pulse mode), the co-doped laser shows better temperature stability with higher characteristic temperatures of threshold current (T0) and slope efficiency (T1). Furthermore, the co-doped laser can maintain stable continuous-wave ground-state lasing up to a high temperature of 115°C. These results prove the great potential of co-doping technique for enhancing silicon-based QD laser performances towards lower power consumption, higher temperature stability, and higher operating temperature, to boost the development of high-performance silicon photonic chips.