Ultimate Limit in Optoelectronic Performances of Monolayer WSe2 Sloping-Channel Transistors.
Nano Lett
; 23(14): 6664-6672, 2023 Jul 26.
Article
em En
| MEDLINE
| ID: mdl-37432041
ABSTRACT
Atomically thin monolayer two-dimensional (2D) semiconductors with natural immunity to short channel effects are promising candidates for sub-10 nm very large-scale integration technologies. Herein, the ultimate limit in optoelectronic performances of monolayer WSe2 field-effect transistors (FETs) is examined by constructing a sloping channel down to 6 nm. Using a simple scaling method compatible with current micro/nanofabrication technologies, we achieve a record high saturation current up to 1.3 mA/µm at room temperature, surpassing any reported monolayer 2D semiconductor transistors. Meanwhile, quasi-ballistic transport in WSe2 FETs is first demonstrated; the extracted high saturation velocity of 4.2 × 106 cm/s makes it suitable for extremely sensitive photodetectors. Furthermore, the photoresponse speed can be improved by reducing channel length due to an electric field-assisted detrapping process of photogenerated carriers in localized states. As a result, the sloping-channel device exhibits a faster response, higher detectivity, and additional polarization resolution ability compared to planar micrometer-scale devices.
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1
Coleções:
01-internacional
Base de dados:
MEDLINE
Idioma:
En
Revista:
Nano Lett
Ano de publicação:
2023
Tipo de documento:
Article
País de afiliação:
China