Bioinspired Fluorine Labeling for 19F NMR-Based Plasma Amine Profiling.

Metabolite profiling serves as a powerful tool that advances our understanding of biological systems, disease mechanisms, and environmental interactions. In this study, we present an approach employing 19F-nuclear magnetic resonance (19F NMR) spectroscopy for plasma amine profiling. This method utilizes a highly efficient and reliable fluorine-labeling reagent, 3,5-difluorosalicylaldehyde, which effectively emulates pyridoxal phosphate, facilitating the formation of Schiff base compounds with primary amines. The fluorine labeling allows for distinct resolution of 19F NMR signals from amine mixtures, leading to precise identification and quantification of amine metabolites in human plasma. This advancement offers valuable tools for furthering metabolomics research.

Electroreductive formylation of activated alcohols via radical-polar crossover.

The direct synthesis of sterically hindered aldehydes is highly challenging. Herein, we report a direct approach to generate such compounds via electroreductive cleavage of the C(sp3)-O bond of activated alcohols. Under the established reaction conditions, benzylic radical intermediates were efficiently generated. A subsequent radical-polar crossover generated carbanions that further reacted with N,N-dimethylformamide to form various aldehydes with tertiary or quaternary benzylic carbon centers. The feasibility of a gram-scale synthesis was also demonstrated. This reaction is also operated in a simple undivided cell, which avoids the use of any transition metal catalysts, toxic gas, and reductants.

Sidewall patterning of organic-inorganic multilayer thin film encapsulation by adhesion lithography.

A simple sidewall patterning process for organic-inorganic multilayer thin-film encapsulation (TFE) has been proposed and demonstrated. An Al2O3 thin film grown by atomic layer deposition (ALD) was patterned by adhesion lithography using the difference in interfacial adhesion strength. The difference in interfacial adhesion strength was provided by the vapor-deposited fluoro-octyl-trichloro-silane self-assembled monolayer (SAM) patterns formed by a shadow mask. The sidewall patterning of multilayer TFE was shown possible by repeating the adhesion lithography and the vapor deposition of organic polymer and SAM patterns using shadow masks. The proposed process has the advantage of being able to pattern the blanket ALD-grown Al2O3 thin films by adhesion lithography using a SAM pattern that can be more accurately predefined with a shadow mask.