RESUMEN
Photoalignment of liquid crystal polarization grating based on optical imprinting is a promising technique for polarization grating mass production. However, when the period of the optical imprinting grating is in the sub-micrometer level, the zero-order energy from the master grating will become high, and it will strongly affect the photoalignment quality. This paper proposes a double-twisted polarization grating structure to eliminate the zero-order disturbance of master grating and gives the design method. Based on the designed results, a master grating was prepared, and the optically imprinted photoalignment of polarization grating with a period of 0.5µm was fabricated. This method has the advantages of high efficiency and significantly greater environmental tolerance than the traditional polarization holographic photoalignment methods. It has the potential to be used for large-area polarization holographic gratings production.
RESUMEN
In this Letter, a contact polarization holographic photoalignment method is proposed. In the holographic recording, a phase mask is contacted with a photoalignment film, making light carrying wavefront information interfere with reference light in the near-field region to realize polarization holographic pattern recording with a sub-micrometer feature size. The relevant theoretical derivation is given, and holographic recording of a 0.4 µm feature-size phase mask is realized. The proposed method can conveniently realize liquid-crystal binary diffractive optical elements with a sub-micrometer feature size. Off-axis diffraction can also be realized by superimposing the grating information by changing the angle between the substrate and the interference light.