RESUMEN
Aqueous solutions of zirconium and hafnium (M) halides (X) with atomic ratios α = X/M near 1 form glasses on evaporation. Herein, we describe the preparation and properties of these glasses and discuss the nature of the crystal-glass equilibria beyond the pure glass compositions. Small- and wide-angle X-ray scattering (SWAXS) studies reveal increased polymerization as α decreases from 2 to 1. The glasses are found to be much denser than their crystalline counterparts. Crystals forming in contact with glasses retain the well-known Zr-tetrameric hydroxo cluster unit with hydroxide compensating for the lowered halide content. We find that the chemical formulas for all of the solid hydroxohalides may be described by the single parameter α, according to the formula M(OH)4-αXα·(4α - 1)H2O. This description is valid for the crystalline chloride (MOX2·8H2O = M(OH)2X2·7H2O), the glassy solids with α < 2, and hydrolyzed products (α ≈ 0.5). The water content is also determined by α with hydroxide-hydrogen bonding replacing halide-hydrogen bonding as α decreases. A Eu3+-doped Zr,Cl glass exhibits photoluminescence transitions 5D0 â 7Fn (n = 1, 2, and 4) of Eu3+, illustrating the asymmetric nature of the dopant sites in the glass.
RESUMEN
The ternary oxides, Li2NpO4 and Li4NpO5, were synthesized under mild hydrothermal conditions using concentrated LiOH solutions containing NpO2(NO3)2. The reactions resulted in the formation of single crystals of both compounds, enabling the determination of their single crystal structures for the first time. Exploration of the synthetic phase space demonstrates that the resulting neptunate phases are dependent on the concentration of LiOH, transitioning from Li2NpO4, containing a typical octahedral neptunyl geometry with two shorter Np≡O bonds, at lower LiOH concentrations to Li4NpO5 with two long and four short Np-O bonds under saturated solution conditions. Reactions exploring the same synthetic conditions are also reported for uranyl(VI) for comparison. Raman spectra of the compounds were collected and analyzed to evaluate the Np-O bonding in these compounds.
RESUMEN
This work complements our recent discovery of new phases derived from zirconium perchlorate by addition of hydrogen peroxide. Here, we investigate analogous reactions with hafnium perchlorate, which is found to have modifications of the Clearfield-Vaughan tetramer (CVT). For hafnium perchlorate derivatives, we find distorted versions of CVT by X-ray diffraction and study the reaction solutions by SAXS, Raman spectroscopy, and ESI-MS. Furthermore, we investigate mixed Hf-Zr solution and solid phases and find the latter resemble the zirconium family at low Hf concentrations and the hafnium family at higher hafnium contents.
RESUMEN
Alkyltin clusters are exploited in nanolithography for the fabrication of microelectronics. The alkyltin Keggin family is unique among Keggin clusters across the periodic table; its members appear to favor the lower-symmetry ß and γ isomers rather than the highly symmetrical α and ε isomers. Therefore, the alkyltin Keggin family may provide important fundamental information about the formation and isomerization of Keggin clusters. We have synthesized and structurally characterized a new butyltin Keggin cluster with a tetrahedral Ca2+ center, fully formulated [(BuSn)12(CaO4)(OCH3)12(O)4(OH)8]2+ (ß-CaSn12). The synthesis is a simple one-step process. Extensive solution characterization including electrospray ionization mass spectrometry, small-angle X-ray scattering, and multinuclear (1H, 13C, and 119Sn) nuclear magnetic resonance shows ß-CaSn12 is essentially phase-pure and stable. This differs from the previously reported Na-centered analogues that always form a mixture of ß and γ isomers, with facile interconversion. Therefore, this study has clarified prior confusion over complex spectroscopic and crystallographic characterization of the Na-centered analogues. Density functional theory calculations showed the following stability order: γ-CaSn12 < γ-NaSn12 < ß-CaSn12 < ß-NaSn12. The ß analogue is always more stable than the γ analogue, consistent with experiment. Notable outcomes of this study include a rare tetrahedral Ca coordination, a Na-free alkyltin cluster (important for microelectronics manufacturing), and a better understanding of Keggin families built of different metal cations.
RESUMEN
Zr/Hf aqueous-acid clusters are relevant to inorganic nanolithography, metal-organic frameworks (MOFs), catalysis, and nuclear fuel reprocessing, but only two topologies have been identified. The (Zr4) polyoxocation is the ubiquitous square aqueous Zr/Hf-oxysalt of all halides (except fluoride), and prior-debated for perchlorate. Simply adding peroxide to a Zr oxyperchlorate solution leads to a striking modification of Zr4, yielding two structures identified by single-crystal X-ray diffraction. Zr25, isolated from a reaction solution of 1:1 peroxide/Zr, is fully formulated [Zr25O10(OH)50(O2)5(H2O)40](ClO4)10·xH2O. Zr25 is a pentagonal assembly of 25 Zr-oxy/peroxo/hydroxyl polyhedra and is the largest Zr/Hf cluster topology identified to date. Yet it is completely soluble in common organic solvents. ZrTd, an oxo-centered tetrahedron fully formulated [Zr4(OH)4(µ-O2)2(µ4-O)(H2O)12](ClO4)6·xH2O, is isolated from a 10:1 peroxide/Zr reaction solution. The formation pathways of ZrTd and Zr25 in water were described by small-angle X-ray scattering (SAXS), pair distribution function (PDF), and electrospray ionization mass spectrometry (ESI-MS). Zr4 undergoes disassembly by 1 equiv of peroxide (per Zr) to yield small oligomers of Zr25 that assemble predominantly in the solid state, an unusual crystal growth mechanism. The self-buffering acidity of the Zr-center prevents Zr25 from remaining intact in water. Identical species distribution and cluster fragments are observed in the assembly of Zr25 and upon redissolution of Zr25. On the other hand, the 10:1 peroxide/Zr ratio of the ZrTd reaction solution yields larger prenucleation clusters before undergoing peroxide-promote disassembly into smaller fragments. Neither these larger cluster intermediates of ZrTd nor the smaller intermediates of Zr25 have yet been isolated and structurally characterized, and they represent an opportunity to expand this new class of group IV polycations, obtained by peroxide reactivity and ligation.
RESUMEN
Dodecameric (Sn12 ) and hexameric topologies dominate monoalkyltin-oxo cluster chemistry. Their condensation, triggered by radiation exposure, recently produced unprecedented patterning performance in EUV lithography. A new cluster topology was crystallized from industrial n-BuSnOOH, and additional characterization techniques indicate other clusters are present. Single-crystal X-ray analysis reveals a ß-Keggin cluster, which is known but less common than other Keggin isomers in polyoxometalate and polyoxocation chemistry. The structure is formulated [NaO4 (BuSn)12 (OH)3 (O)9 (OCH3 )12 (Sn(H2 O)2 )] (ß-NaSn13 ). SAXS, NMR, and ESI MS differentiate ß-NaSn13 , Sn12 , and other clusters present in crude "n-BuSnOOH" and highlight the role of Na as a template for alkyltin Keggin clusters. Unlike other alkyltin clusters that are cationic, ß-NaSn13 is neutral. Consequently, it stands as a unique model system, absent of counterions, to study the transformation of clusters to films and nanopatterns.
RESUMEN
Organotin photoresists have shown promise for next-generation lithography because of their high extreme ultraviolet (EUV) absorption cross sections, their radiation sensitive chemistries, and their ability to enable high-resolution patterning. To better understand both temperature- and radiation-induced reaction mechanisms, we have studied a model EUV photoresist, which consists of a charge-neutral butyl-tin cluster. Temperature-programmed desorption (TPD) showed very little outgassing of the butyl-tin resist in ultrahigh vacuum and excellent thermal stability of the butyl groups. TPD results indicated that decomposition of the butyl-tin resist was first order with a fairly constant decomposition energy between 2.4 and 3.0 eV, which was determined by butyl group desorption. Electron-stimulated desorption (ESD) showed that butyl groups were the primary decomposition product for electron kinetic energies expected during EUV exposures. X-ray photoelectron spectroscopy was performed before and after low-energy electron exposure to evaluate the compositional and chemical changes in the butyl-tin resists after interaction with radiation. The effect of molecular oxygen during ESD experiments was evaluated, and it was found to enhance butyl group desorption during exposure and resulted in a significant increase in the ESD cross section by over 20%. These results provide mechanistic information that can be applied to organotin EUV photoresists, where a significant increase in photoresist sensitivity may be obtained by varying the ambient conditions during EUV exposures.
RESUMEN
Advances in extreme ultraviolet (EUV) photolithography require the development of next-generation resists that allow high-volume nanomanufacturing with a single nanometer patterning resolution. Organotin-based photoresists have demonstrated nanopatterning with high resolution, high sensitivity, and low-line edge roughness. However, very little is known regarding the detailed reaction mechanisms that lead to radiation-induced solubility transitions. In this study, we investigate the interaction of soft X-ray radiation with organotin clusters to better understand radiation-induced chemistries associated with EUV lithography. Butyltin Keggin clusters (ß-NaSn13) were used as a model organotin photoresist, and characterization was performed using ambient-pressure X-ray photoelectron spectroscopy. The changes in relative atomic concentrations and associated chemical states in ß-NaSn13 resists were evaluated after exposure to radiation for a range of ambient conditions and photon energies. A significant reduction in the C 1s signal versus exposure time was observed, which corresponds to the radiation-induced homolytic cleavage of the butyltin bond in the ß-NaSn13 clusters. To improve the resist sensitivity, we evaluated the effect of oxygen partial pressure during radiation exposures. We found that both photon energy and oxygen partial pressure had a strong influence on the butyl group desorption rate. These studies advance the understanding of radiation-induced processes in ß-NaSn13 photoresists and provide mechanistic insights for EUV photolithography.
RESUMEN
The Keggin structure is prevalent in nature and synthesis, self-assembled from many metals across the periodic table as both isolated clusters and building blocks of condensed framework oxides. Here we present a one-step synthesis to obtain the sodium-centered butyltin Keggin ion in high yield and high purity, important for mechanistic nanolithography studies. Extensive solution characterization (small-angle X-ray scattering, 1H, 13C and 119Sn nuclear magnetic resonance, electrospray mass spectrometry) also confirms solutions contain only the Na-centered dodecamers. We report three butyltin Keggin structures: the ß-isomer (ß-NaSn12), the γ-isomer (γ-NaSn12), and a γ-isomer capped with an additional butyltin (γ-NaSn13). All Keggin ions presented here have the general formula [NaO4BuSn12(OCH3)12(O,OH)12] (Bu = butyl), and are of neutral charge. The lack of counterions (OH-) facilitates mechanistic lithographic studies without inference from hydrolysis chemistry. The methanol reaction media enables solubility and ligates the cluster, both important to obtain high purity materials. Despite the monospecific nature of the NaSn12 solutions, NMR reveals both isomer interconversion and ligand exchange. DFT computational comparisons of our three isolated structures, the capped ß-isomer (ß-NaSn13), along with hypothetical α-isomers (α-NaSn12 and α-NaSn13), showed that the stability ranks ß-NaSn12 > γ-NaSn12 > α-NaSn12, consistent with experimental observation. The uncapped isomers were computationally determined to be more stable than the respective capped analogues. These clusters provide a unique opportunity to investigate the lower-symmetry Keggin isomers, and to determine structural factors that control isomer selectivity as well as isomer labilization.