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Remote Plasma Oxidation and Atomic Layer Etching of MoS2.
Zhu, Hui; Qin, Xiaoye; Cheng, Lanxia; Azcatl, Angelica; Kim, Jiyoung; Wallace, Robert M.
Afiliación
  • Zhu H; Department of Materials Science and Engineering, University of Texas at Dallas , Richardson, Texas 75080, United States.
  • Qin X; Department of Materials Science and Engineering, University of Texas at Dallas , Richardson, Texas 75080, United States.
  • Cheng L; Department of Materials Science and Engineering, University of Texas at Dallas , Richardson, Texas 75080, United States.
  • Azcatl A; Department of Materials Science and Engineering, University of Texas at Dallas , Richardson, Texas 75080, United States.
  • Kim J; Department of Materials Science and Engineering, University of Texas at Dallas , Richardson, Texas 75080, United States.
  • Wallace RM; Department of Materials Science and Engineering, University of Texas at Dallas , Richardson, Texas 75080, United States.
ACS Appl Mater Interfaces ; 8(29): 19119-26, 2016 Jul 27.
Article en En | MEDLINE | ID: mdl-27386734
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Texto completo: 1 Banco de datos: MEDLINE Idioma: En Revista: ACS Appl Mater Interfaces Asunto de la revista: BIOTECNOLOGIA / ENGENHARIA BIOMEDICA Año: 2016 Tipo del documento: Article País de afiliación: Estados Unidos
Texto completo
Imprimir
XML
PubMed Links
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Texto completo: 1 Banco de datos: MEDLINE Idioma: En Revista: ACS Appl Mater Interfaces Asunto de la revista: BIOTECNOLOGIA / ENGENHARIA BIOMEDICA Año: 2016 Tipo del documento: Article País de afiliación: Estados Unidos