Aberration-Corrected Electron Beam Lithography at the One Nanometer Length Scale.

Manfrinato, Vitor R; Stein, Aaron; Zhang, Lihua; Nam, Chang-Yong; Yager, Kevin G; Stach, Eric A; Black, Charles T

Manfrinato, Vitor R; Stein, Aaron; Zhang, Lihua; Nam, Chang-Yong; Yager, Kevin G; Stach, Eric A; Black, Charles T.

Afiliación

Manfrinato VR; Center for Functional Nanomaterials, Brookhaven National Laboratory , Upton, New York 11973-5000, United States.
Stein A; Center for Functional Nanomaterials, Brookhaven National Laboratory , Upton, New York 11973-5000, United States.
Zhang L; Center for Functional Nanomaterials, Brookhaven National Laboratory , Upton, New York 11973-5000, United States.
Nam CY; Center for Functional Nanomaterials, Brookhaven National Laboratory , Upton, New York 11973-5000, United States.
Yager KG; Center for Functional Nanomaterials, Brookhaven National Laboratory , Upton, New York 11973-5000, United States.
Stach EA; Center for Functional Nanomaterials, Brookhaven National Laboratory , Upton, New York 11973-5000, United States.
Black CT; Center for Functional Nanomaterials, Brookhaven National Laboratory , Upton, New York 11973-5000, United States.

Nano Lett ; 17(8): 4562-4567, 2017 08 09.

Article en En | MEDLINE | ID: mdl-28418673

Palabras clave

Nanofabrication; aberration correction; electron microscopy; electron-beam lithography; nanomaterials; pattern transfer; poly(methyl methacrylate)

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Texto completo: 1 Banco de datos: MEDLINE Idioma: En Revista: Nano Lett Año: 2017 Tipo del documento: Article País de afiliación: Estados Unidos

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Texto completo: 1 Banco de datos: MEDLINE Idioma: En Revista: Nano Lett Año: 2017 Tipo del documento: Article País de afiliación: Estados Unidos