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Isostructural metal-insulator transition in VO2.
Lee, D; Chung, B; Shi, Y; Kim, G-Y; Campbell, N; Xue, F; Song, K; Choi, S-Y; Podkaminer, J P; Kim, T H; Ryan, P J; Kim, J-W; Paudel, T R; Kang, J-H; Spinuzzi, J W; Tenne, D A; Tsymbal, E Y; Rzchowski, M S; Chen, L Q; Lee, J; Eom, C B.
Afiliación
  • Lee D; Department of Materials Science and Engineering, University of Wisconsin, Madison, WI 53706, USA.
  • Chung B; School of Advanced Materials Science and Engineering, Sungkyunkwan University, Suwon 16419, Korea.
  • Shi Y; Department of Materials Science and Engineering, Pennsylvania State University, University Park, PA 16802, USA.
  • Kim GY; Department of Materials Modeling and Characterization, Korea Institute of Materials Science, Changwon 642-831, Korea.
  • Campbell N; Department of Physics, University of Wisconsin, Madison, WI 53706, USA.
  • Xue F; Department of Materials Science and Engineering, Pennsylvania State University, University Park, PA 16802, USA.
  • Song K; Department of Materials Modeling and Characterization, Korea Institute of Materials Science, Changwon 642-831, Korea.
  • Choi SY; Department of Materials Modeling and Characterization, Korea Institute of Materials Science, Changwon 642-831, Korea.
  • Podkaminer JP; Department of Materials Science and Engineering, University of Wisconsin, Madison, WI 53706, USA.
  • Kim TH; Department of Materials Science and Engineering, University of Wisconsin, Madison, WI 53706, USA.
  • Ryan PJ; Advanced Photon Source, Argonne National Laboratory, Argonne, IL 60439, USA.
  • Kim JW; School of Physical Sciences, Dublin City University, Dublin 9, Ireland.
  • Paudel TR; Advanced Photon Source, Argonne National Laboratory, Argonne, IL 60439, USA.
  • Kang JH; Department of Physics and Astronomy and Nebraska Center for Materials and Nanoscience, University of Nebraska, Lincoln, NE 68588, USA.
  • Spinuzzi JW; Department of Materials Science and Engineering, University of Wisconsin, Madison, WI 53706, USA.
  • Tenne DA; Department of Physics, Boise State University, Boise, ID 83725, USA.
  • Tsymbal EY; Department of Physics, Boise State University, Boise, ID 83725, USA.
  • Rzchowski MS; Department of Physics and Astronomy and Nebraska Center for Materials and Nanoscience, University of Nebraska, Lincoln, NE 68588, USA.
  • Chen LQ; Department of Physics, University of Wisconsin, Madison, WI 53706, USA.
  • Lee J; Department of Materials Science and Engineering, Pennsylvania State University, University Park, PA 16802, USA.
  • Eom CB; School of Advanced Materials Science and Engineering, Sungkyunkwan University, Suwon 16419, Korea. eom@engr.wisc.edu jclee@skku.edu.
Science ; 362(6418): 1037-1040, 2018 11 30.
Article en En | MEDLINE | ID: mdl-30498123
ABSTRACT
The metal-insulator transition in correlated materials is usually coupled to a symmetry-lowering structural phase transition. This coupling not only complicates the understanding of the basic mechanism of this phenomenon but also limits the speed and endurance of prospective electronic devices. We demonstrate an isostructural, purely electronically driven metal-insulator transition in epitaxial heterostructures of an archetypal correlated material, vanadium dioxide. A combination of thin-film synthesis, structural and electrical characterizations, and theoretical modeling reveals that an interface interaction suppresses the electronic correlations without changing the crystal structure in this otherwise correlated insulator. This interaction stabilizes a nonequilibrium metallic phase and leads to an isostructural metal-insulator transition. This discovery will provide insights into phase transitions of correlated materials and may aid the design of device functionalities.

Texto completo: 1 Banco de datos: MEDLINE Idioma: En Revista: Science Año: 2018 Tipo del documento: Article País de afiliación: Estados Unidos

Texto completo: 1 Banco de datos: MEDLINE Idioma: En Revista: Science Año: 2018 Tipo del documento: Article País de afiliación: Estados Unidos