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Extreme UV Resist Exhibiting Synergism between Chemical and Physical Crosslinking Mechanisms.
Ku, Yejin; Kim, KangHyun; Oh, Hyun-Taek; Park, Byeong-Gyu; Lee, Sangsul; Lee, Jin-Kyun; Koh, Chawon; Nishi, Tsunehiro; Kim, Hyun-Woo.
Afiliación
  • Ku Y; Program in Environment and Polymer Engineering, Inha University, Incheon 22212, Republic of Korea.
  • Kim K; Department of Mechanical Engineering, POSTECH, Pohang 37673, Republic of Korea.
  • Oh HT; Department of Polymer Science and Engineering, Inha University, Incheon 22212, Republic of Korea.
  • Park BG; Pohang Accelerator Laboratory, POSTECH, Pohang 37673, Republic of Korea.
  • Lee S; Pohang Accelerator Laboratory, POSTECH, Pohang 37673, Republic of Korea.
  • Lee JK; Program in Environment and Polymer Engineering, Inha University, Incheon 22212, Republic of Korea.
  • Koh C; Department of Polymer Science and Engineering, Inha University, Incheon 22212, Republic of Korea.
  • Nishi T; Samsung Electronics Co., Ltd., Semiconductor R&D Center, Suwon, Gyeonggi-do 18448, Republic of Korea.
  • Kim HW; Samsung Electronics Co., Ltd., Semiconductor R&D Center, Suwon, Gyeonggi-do 18448, Republic of Korea.
Langmuir ; 39(9): 3462-3470, 2023 Mar 07.
Article en En | MEDLINE | ID: mdl-36827550
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Texto completo: 1 Banco de datos: MEDLINE Idioma: En Revista: Langmuir Asunto de la revista: QUIMICA Año: 2023 Tipo del documento: Article
Texto completo
Imprimir
XML
PubMed Links
Buscar en Google

Texto completo: 1 Banco de datos: MEDLINE Idioma: En Revista: Langmuir Asunto de la revista: QUIMICA Año: 2023 Tipo del documento: Article