Nanoscale, surface-confined phase separation by electron beam induced oxidation.
Nanoscale
; 16(31): 14722-14729, 2024 Aug 13.
Article
en En
| MEDLINE
| ID: mdl-38922329
ABSTRACT
Electron-assisted oxidation of Co-Si-based focused electron beam induced deposition (FEBID) materials is shown to form a 2-4 nm metal oxide surface layer on top of an electrically insulating silicon oxide layer less than 10 nm thick. Differences between thermal and electron-induced oxidation on the resulting microstructure are illustrated.
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1
Banco de datos:
MEDLINE
Idioma:
En
Revista:
Nanoscale
Año:
2024
Tipo del documento:
Article
País de afiliación:
Alemania