Gas sensitivity and sensing mechanism studies on Au-doped TiO2 nanotube arrays for detecting SF6 decomposed components.

The analysis to SF6 decomposed component gases is an efficient diagnostic approach to detect the partial discharge in gas-insulated switchgear (GIS) for the purpose of accessing the operating state of power equipment. This paper applied the Au-doped TiO2 nanotube array sensor (Au-TiO2 NTAs) to detect SF6 decomposed components. The electrochemical constant potential method was adopted in the Au-TiO2 NTAs' fabrication, and a series of experiments were conducted to test the characteristic SF6 decomposed gases for a thorough investigation of sensing performances. The sensing characteristic curves of intrinsic and Au-doped TiO2 NTAs were compared to study the mechanism of the gas sensing response. The results indicated that the doped Au could change the TiO2 nanotube arrays' performances of gas sensing selectivity in SF6 decomposed components, as well as reducing the working temperature of TiO2 NTAs.

Separation of SF6 from gas mixtures using gas hydrate formation.

This study aims to examine the thermodynamic feasibility of separating sulfur hexafluoride (SF(6)), which is widely used in various industrial fields and is one of the most potent greenhouse gases, from gas mixtures using gas hydrate formation. The key process variables of hydrate phase equilibria, pressure-composition diagram, formation kinetics, and structure identification of the mixed gas hydrates, were closely investigated to verify the overall concept of this hydrate-based SF(6) separation process. The three-phase equilibria of hydrate (H), liquid water (L(W)), and vapor (V) for the binary SF(6) + water mixture and for the ternary N(2) + SF(6) + water mixtures with various SF(6) vapor compositions (10, 30, 50, and 70%) were experimentally measured to determine the stability regions and formation conditions of pure and mixed hydrates. The pressure-composition diagram at two different temperatures of 276.15 and 281.15 K was obtained to investigate the actual SF(6) separation efficiency. The vapor phase composition change was monitored during gas hydrate formation to confirm the formation pattern and time needed to reach a state of equilibrium. Furthermore, the structure of the mixed N(2) + SF(6) hydrate was confirmed to be structure II via Raman spectroscopy. Through close examination of the overall experimental results, it was clearly verified that highly concentrated SF(6) can be separated from gas mixtures at mild temperatures and low pressure conditions.

Pure SF6 and SF6-N2 mixture gas hydrates equilibrium and kinetic characteristics.

Sulfur hexafluoride (SF6), whether pure or mixed with inexpensive inert gas, has been widely used in a variety of industrial processes, but it is one of the most potent greenhouse gases. For this reason, it is necessary to separate and/or collect it from waste gas streams. In this study, we investigated the pure SF6 and SF6-N2 mixture gas hydrates formation equilibrium aswell asthe gas separation efficiency in the hydrate process. The equilibrium pressure of SF6-N2 mixture gas was higher than that of pure SF6 gas. Phase equilibrium data of SF6-N2 mixture gas was similar to SF6 rather than N2. The kinetics of SF6-N2 mixture gas was controlled by the amount of SF6 at the initial gas composition as well as N2 gas incorporation into the S-cage of structure-II hydrate preformed by the SF6 gas. Raman analysis confirmed the N2 gas incorporation into the S-cage of structure-II hydrate. The compositions in the hydrate phase were found to be 71, 79, 80, and 81% of SF6 when the feed gas compositions were 40, 65, 70, and 73% of SF6, respectively. The present study provides basic information for the separation and purification of SF6 from mixed SF6 gas containing inert gases.

Microwave plasma removal of sulphur hexafluoride.

Sulphur hexafluoride (SF(6)) gas is a common pollutant emitted during the plasma etching of thin films and plasma cleaning chemical vapor deposition (CVD) production processes used in the semiconductor industry. In this paper a method using microwave (2.45GHz frequency) plasmas sustained at atmospheric pressure for the abatement of SF(6) is investigated experimentally for various gas mixture constituents and operating conditions, with respect to its ability to decompose SF(6) to less harmful molecules. The destruction and removal efficiencies (DRE) of plasma abatement of SF(6) at concentrations between 1.7 and 5% in nitrogen in the presence of water vapor were studied as a function of the total gas flow rate and microwave power. Water vapor proved to be an effective source of free radical species that reacts with the radicals and ions resulting from SF(6) fragmentation in the plasma and also, it proved to reduce the process by-products. It was measured that approximately 25% of the initial SF(6) is converted to SO(2). Destruction and removal efficiencies of SF(6) up to 99.9% have been achieved.

Abatement of sulfur hexafluoride emissions from the semiconductor manufacturing process by atmospheric-pressure plasmas.

Sulfur hexafluoride (SF6) is an important gas for plasma etching processes in the semiconductor industry. SF6 intensely absorbs infrared radiation and, consequently, aggravates global warming. This study investigates SF6 abatement by nonthermal plasma technologies under atmospheric pressure. Two kinds of nonthermal plasma processes--dielectric barrier discharge (DBD) and combined plasma catalysis (CPC)--were employed and evaluated. Experimental results indicated that as much as 91% of SF6 was removed with DBDs at 20 kV of applied voltage and 150 Hz of discharge frequency for the gas stream containing 300 ppm SF6, 12% oxygen (O2), and 40% argon (Ar), with nitrogen (N2) as the carrier gas. Four additives, including Ar, O2, ethylene (C2H4), and H2O(g), are effective in enhancing SF6 abatement in the range of conditions studied. DBD achieves a higher SF6 removal efficiency than does CPC at the same operation condition. But CPC achieves a higher electrical energy utilization compared with DBD. However, poisoning of catalysts by sulfur (S)-containing species needs further investigation. SF6 is mainly converted to SOF2, SO2F4, sulfur dioxide (SO2), oxygen difluoride (OF2), and fluoride (F2). They do not cause global warming and can be captured by either wet scrubbing or adsorption. This study indicates that DBD and CPC are feasible control technologies for reducing SF6 emissions.