Structure and Magnetic Properties of Co40Fe40V20 Thin Films.

This study investigated the structure and magnetic properties of Co40Fe40V20 thin films with a thicknesses (tf) of 10 nm to 100 nm on a glass substrate. The X-ray diffraction (XRD) patterns of the CoFeV films demonstrated a significant crystalline body-centered cubic (BCC) CoFe (110) structure when the thickness was between 60 and 100 nm, and an amorphous status were shown when the thickness was from 10 to 50 nm. The strongest crystalline XRD peak was at 60 nm because it had a continuous mode of film growth and induced a large grain distribution. The low-frequency alternating current magnetic susceptibility (Ï°ac) property decreased when the frequency increased. The lowest Ï°ac value was detected at 60 nm owing to the large grain distribution inducing high coercivity (Hc) and then enhancing the spin coupling strength. The external field (Hext) was difficult to rotate spin state, then deduces the spin sensitivity and Ï°ac value is decreased. The highest Ï°ac meant the spin sensitivity was maximized at the optimal resonance frequency. The 50-mm thickness had the highest Ï°ac 0.045 value at an fres of 100 Hz. The fres value was less than 1000 Hz at all CoFeV thicknesses, suggesting that CoFeV films would be suitable for low-frequency magnetic component applications. Moreover, the saturation magnetization (Ms) revealed a thickness effect when the thicknesses had a larger Ms. The Hc values were between 3 Oe and 10 Oe at all CoFeV films, except for 60 nm. The Hc of the 60 nm film was about 80 Oe due to the larger grain distribution, and it induced strong remanent magnetization (Mr) and a larger squareness ratio (Mr/Ms) of 92%. The results of the magnetic measurement showed that the 60 nm Co40Fe40V20 film had greater Hc and a good squareness ratio.

Oxygen Passivation Mediated Tunability of Trion and Excitons in MoS_{2}.

Using wide spectral range in situ spectroscopic ellipsometry with systematic ultrahigh vacuum annealing and in situ exposure to oxygen, we report the complex dielectric function of MoS_{2} isolating the environmental effects and revealing the crucial role of unpassivated and passivated sulphur vacancies. The spectral weights of the A (1.92 eV) and B (2.02 eV) exciton peaks in the dielectric function reduce significantly upon annealing, accompanied by spectral weight transfer in a broad energy range. Interestingly, the original spectral weights are recovered upon controlled oxygen exposure. This tunability of the excitonic effects is likely due to passivation and reemergence of the gap states in the band structure during oxygen adsorption and desorption, respectively, as indicated by ab initio density functional theory calculation results. This Letter unravels and emphasizes the important role of adsorbed oxygen in the optical spectra and many-body interactions of MoS_{2}.

Gap States at Low-Angle Grain Boundaries in Monolayer Tungsten Diselenide.

Two-dimensional (2D) transition metal dichalcogenides (TMDs) have revealed many novel properties of interest to future device applications. In particular, the presence of grain boundaries (GBs) can significantly influence the material properties of 2D TMDs. However, direct characterization of the electronic properties of the GB defects at the atomic scale remains extremely challenging. In this study, we employ scanning tunneling microscopy and spectroscopy to investigate the atomic and electronic structure of low-angle GBs of monolayer tungsten diselenide (WSe2) with misorientation angles of 3-6°. Butterfly features are observed along the GBs, with the periodicity depending on the misorientation angle. Density functional theory calculations show that these butterfly features correspond to gap states that arise in tetragonal dislocation cores and extend to distorted six-membered rings around the dislocation core. Understanding the nature of GB defects and their influence on transport and other device properties highlights the importance of defect engineering in future 2D device fabrication.

Three-dimensional molybdenum sulfide sponges for electrocatalytic water splitting.

Electroactive MoSx catalysts on porous 3D sponges synthezied by a simple and scalable thermolysis process are proposed. Although no conducting materials are used to host the MoSx catalysts, they still serve as efficient electrodes for hydrogen evolution. The high current density of the MoSx-coated sponges are attributed to the large electrochemical surface area and their S-rich chemical structure.

Controllable Doping Characteristics for WSxSey Monolayers Based on the Tunable S/Se Ratio.

Transition metal dichalcogenides (TMDs) have attracted much attention because of their unique characteristics and potential applications in electronic devices. Recent reports have successfully demonstrated the growth of 2-dimensional MoSxSey, MoxWyS2, MoxWySe2, and WSxSey monolayers that exhibit tunable band gap energies. However, few works have examined the doping behavior of those 2D monolayers. This study synthesizes WSxSey monolayers using the CVD process, in which different heating temperatures are applied to sulfur powders to control the ratio of S to Se in WSxSey. Increasing the Se component in WSxSey monolayers produced an apparent electronic state transformation from p-type to n-type, recorded through energy band diagrams. Simultaneously, p-type characteristics gradually became clear as the S component was enhanced in WSxSey monolayers. In addition, Raman spectra showed a red shift of the WS2-related peaks, indicating n-doping behavior in the WSxSey monolayers. In contrast, with the increase of the sulfur component, the blue shift of the WSe2-related peaks in the Raman spectra involved the p-doping behavior of WSxSey monolayers. In addition, the optical band gap of the as-grown WSxSey monolayers from 1.97 eV to 1.61 eV is precisely tunable via the different chalcogenide heating temperatures. The results regarding the doping characteristics of WSxSey monolayers provide more options in electronic and optical design.

Thickness, Annealing, and Surface Roughness Effect on Magnetic and Significant Properties of Co40Fe40B10Dy10 Thin Films.

In this study, Co40Fe40B10Dy10 thin films were deposited using a direct current (DC) magnetron sputtering technique. The films were deposited on glass substrates with thicknesses of 10, 20, 30, 40, and 50 nm, and heat-treated in a vacuum annealing furnace at 100, 200, and 300 °C. Various instruments were used to examine and analyze the effects of roughness on the magnetic, adhesive, and mechanical properties. From the low frequency alternating current magnetic susceptibility (χac) results, the optimum resonance frequency is 50 Hz, and the maximum χac value tends to increase with the increase in the thicknesses and annealing temperatures. The maximum χac value is 0.18 at a film thickness of 50 nm and an annealing temperature of 300 °C. From the four-point probe, it is found that the resistivity and sheet resistance values decrease with the increase in film deposition thicknesses and higher annealing temperatures. From the magnetic force microscopy (MFM), the stripe-like magnetic domain distribution is more obvious with the increase in annealing temperature. According to the contact angle data, at the same annealing temperature, the contact angle decreases as the thickness increases due to changes in surface morphology. The maximal surface energy value at 300 °C is 34.71 mJ/mm2. The transmittance decreases with increasing film thickness, while the absorption intensity is inversely proportional to the transmittance, implying that the thickness effect suppresses the photon signal. Smoother roughness has less domain pinning, more carrier conductivity, and less light scattering, resulting in superior magnetic, electrical, adhesive, and optical performance.

Investigation of Sm Addition on Microstructural and Optical Properties of CoFe Thin Films.

CoFe-based alloys and rare earth (RE) elements are among the most studied materials in applying magnetic devices to improve soft magnetic characteristics. A series of Co40Fe40Sm20 films are deposited on a glass substrate via the sputtering technique, followed by an annealing process to investigate their effect on microstructural and optical properties of Co40Fe40Sm20 films. In this study, the increase in the thickness of Co40Fe40Sm20 films and annealing temperatures resulted in a smoother surface morphology. The 40 nm Co40Fe40Sm20 films annealed 300 °C are expected to have good wear resistance and adhesive properties due to their high values of H/E ratio and surface energy. Optical transparency also increased due to the smoother surface of the Co40Fe40Sm20 films.

The Influence of Annealing and Film Thickness on the Specific Properties of Co40Fe40Y20 Films.

Cobalt Iron Yttrium (CoFeY) magnetic film was made using the sputtering technique in order to investigate the connection between the thickness and annealing procedures. The sample was amorphous as a result of an insufficient thermal driving force according to X-ray diffraction (XRD) examination. The maximum low-frequency alternate-current magnetic susceptibility (χac) values were raised in correlation with the increased thickness and annealing temperatures because the thickness effect and Y addition improved the spin exchange coupling. The best value for a 50 nm film at annealing 300 °C for χac was 0.20. Because electron carriers are less constrained in their conduction at thick film thickness and higher annealing temperatures, the electric resistivity and sheet resistance are lower. At a thickness of 40 nm, the film's maximum surface energy during annealing at 300 °C was 28.7 mJ/mm2. This study demonstrated the passage of photon signals through the film due to the thickness effect, which reduced transmittance. The best condition was found to be 50 nm with annealing at 300 °C in this investigation due to high χac, strong adhesion, and low resistivity, which can be used in magnetic fields.

Surface Roughness-Induced Changes in Important Physical Features of CoFeSm Thin Films on Glass Substrates during Annealing.

Co60Fe20Sm20 thin films were deposited onto glass substrates in a high vacuum setting. The films varied in thickness from 10 to 50 nm and underwent annealing processes at different temperatures: room temperature (RT), 100, 200, and 300 °C. Our analysis encompassed structural, magnetic, electrical, nanomechanical, adhesive, and optical properties in relation to film thickness and annealing temperature. X-ray diffraction (XRD) analysis did not reveal characteristic peaks in Co60Fe20Sm20 thin films due to insufficient growth-driving forces. Electrical measurements indicated reduced resistivity and sheet resistance with increasing film thickness and higher annealing temperatures, owing to hindered current-carrier transport resulting from the amorphous structure. Atomic force microscope (AFM) analysis showed a decrease in surface roughness with increased thickness and annealing temperature. The low-frequency alternating current magnetic susceptibility (χac) values increased with film thickness and annealing temperature. Nanoindentation analysis demonstrated reduced film hardness and Young's modulus with thicker films. Contact angle measurements suggested a hydrophilic film. Surface energy increased with greater film thickness, particularly in annealed films, indicating a decrease in contact angle contributing to this increase. Transmittance measurements have revealed intensified absorption and reduced transmittance with thicker films. In summary, the surface roughness of CoFeSm films at different annealing temperatures significantly influenced their magnetic, electrical, adhesive, and optical properties. A smoother surface reduced the pinning effect on the domain walls, enhancing the χac value. Additionally, diminished surface roughness led to a lower contact angle and higher surface energy. Additionally, smoother surfaces exhibited higher carrier conductivity, resulting in reduced electrical resistance. The optical transparency decreased due to the smoother surface of Co60Fe20Sm20 films.

Effects of Annealing and Thickness of Co60Fe20Yb20 Nanofilms on Their Structure, Magnetic Properties, Electrical Efficiency, and Nanomechanical Characteristics.

X-ray diffraction (XRD) analysis showed that metal oxide peaks appear at 2θ = 47.7°, 54.5°, and 56.3°, corresponding to Yb2O3 (440), Co2O3 (422), and Co2O3 (511). It was found that oxide formation plays an important role in magnetic, electrical, and surface energy. For magnetic and electrical measurements, the highest alternating current magnetic susceptibility (χac) and the lowest resistivity (×10-2 Ω·cm) were 0.213 and 0.42, respectively, and at 50 nm, it annealed at 300 °C due to weak oxide formation. For mechanical measurement, the highest value of hardness was 15.93 GPa at 200 °C in a 50 nm thick film. When the thickness increased from 10 to 50 nm, the hardness and Young's modulus of the Co60Fe20Yb20 film also showed a saturation trend. After annealing at 300 °C, Co60Fe20Yb20 films of 40 nm thickness showed the highest surface energy. Higher surface energy indicated stronger adhesion, allowing for the formation of multilayer thin films. The optimal condition was found to be 50 nm with annealing at 300 °C due to high χac, strong adhesion, high nano-mechanical properties, and low resistivity.

Effect of Annealing and Thickness of Co40Fe40Yb20 Thin Films on Various Physical Properties on a Glass Substrate.

The aim of this work is to investigate the effect of annealing and thickness on various physical properties in Co40Fe40Yb20 thin films. X-ray diffraction (XRD) was used to determine the amorphous structure of Co40Fe40Yb20 films. The maximum surface energy of 40 nm thin films at 300 °C is 34.54 mJ/mm2. The transmittance and resistivity decreased significantly as annealing temperatures and thickness increased. At all conditions, the 10 nm film had the highest hardness. The average hardness decreased as thickness increased, as predicted by the Hall-Petch effect. The highest low-frequency alternative-current magnetic susceptibility (χac) value was discovered when the film was annealed at 200 °C with 50 nm, and the optimal resonance frequency (ƒres) was in the low frequency range, indicating that the film has good applicability in the low frequency range. At annealed 200 °C and 50 nm, the maximum saturation magnetization (Ms) was discovered. Thermal disturbance caused the Ms to decrease when the temperature was raised to 300 °C. The optimum process conditions determined in this study are 200 °C and 50 nm, with the highest Ms, χac, strong adhesion, and low resistivity, which are suitable for magnetic applications, based on magnetic properties and surface energy.

The Influence of Oxidation on the Magnetic, Electrical, and Mechanical Properties of Co40Fe40Yb20 Films.

A typical body-centered cubic (BCC) CoFe(110) peak was discovered at approximately 2θ = 44.7°. At 2θ = 46°, 46.3°, 47.7°, 55.4°, 54.6°, and 56.4°, the Yb2O3 and Co2O3 oxide peaks were visible in all samples. However, with a heat treatment temperature of 300 °C, there was no typical peak of CoFe(110). Electrical characteristics demonstrated that resistivity and sheet resistance reduced dramatically as film thickness and annealing temperatures increased. At various heat treatments, the maximum hardness was 10 nm. The average hardness decreased as the thickness increased, and the hardness trend decreased slightly as the annealing temperature was higher. The highest low-frequency alternative-current magnetic susceptibility (χac) value was discovered after being annealed at 200 °C with 50 nm, and the optimal resonance frequency (fres) was discovered to be within the low-frequency range, indicating that the Co40Fe40Yb20 film can be used in low-frequency applications. The maximum saturation magnetization (Ms) was annealed at 200 °C for 50 nm. Thermal disturbance caused the Ms to decrease as the temperature reached to 300 °C. The results show that when the oxidation influence of as-deposited and thinner films is stronger than annealing treatments and thicker thickness, the magnetic and electrical properties can be enhanced by the weakening peak of the oxide, which can also reduce interference.

Impact of Annealing on Magnetic Properties and Structure of Co40Fe40W20 Thin Films on Si(100) Substrate.

Co40Fe40W20 monolayers of different thicknesses were deposited on Si(100) substrates by DC magnetron sputtering, with Co40Fe40W20 thicknesses from 10 to 50 nm. Co40Fe40W20 thin films were annealed at three conditions (as-deposited, 250 °C, and 350 °C) for 1 h. The structural and magnetic properties were then examined by X-ray diffraction (XRD), low-frequency alternative-current magnetic susceptibility (χac), and an alternating-gradient magnetometer (AGM). The XRD results showed that the CoFe (110) peak was located at 2θ = 44.6°, but the metal oxide peaks appeared at 2θ = 38.3, 47.6, 54.5, and 56.3°, corresponding to Fe2O3 (320), WO3 (002), Co2O3 (422), and Co2O3 (511), respectively. The saturation magnetization (Ms) was calculated from the slope of the magnetization (M) versus the CoFeW thickness. The Ms values calculated in this manner were 648, 876, 874, and 801 emu/cm3 at the as-deposited condition and post-annealing conditions at 250, 350, and 400 °C, respectively. The maximum MS was about 874 emu/cm3 at a thickness of 50 nm following annealing at 350 °C. It indicated that the MS and the χac values rose as the CoFeW thin films' thickness increased. Owing to the thermal disturbance, the MS and χac values of CoFeW thin films after annealing at 350 °C were comparatively higher than at other annealing temperatures. More importantly, the Co40Fe40W20 films exhibited a good thermal stability. Therefore, replacing the magnetic layer with a CoFeW film improves thermal stability and is beneficial for electrode and strain gauge applications.

Effect of Annealing on the Structural, Magnetic and Surface Energy of CoFeBY Films on Si (100) Substrate.

The structure, magnetic properties, optical properties and adhesion efficiency of CoFeBY films were studied. Co40Fe40B10Y10 alloy was sputtered onto Si (100) with a thickness of 10-50 nm, and then annealed at room temperature, 100 °C, 200 °C and 300 °C for 1 h. X-ray diffraction (XRD) showed that the CoFeBY films deposited at room temperature are amorphous. Annealing at 100 °C gave the films enough thermal energy to change the structure from amorphous to crystalline. After annealing, the CoFeBY thin film showed a body-centered cubic (BCC) CoFeB (110) characteristic peak at 44°. However, the low-frequency alternative-current magnetic susceptibility (χac) and saturation magnetization (MS) increased with the increase of thickness. CoFeBY thin films had the highest χac and MS after annealing at 300 °C compared to that at other temperatures. After annealing at 300 °C, the surface energy of CoFeBY film is the maximum at 50 nm. Higher surface energy indicated stronger adhesion.

Effect of Yttrium Addition on Structure and Magnetic Properties of Co60Fe20Y20 Thin Films.

In this paper, a Co60Fe20Y20 film was sputtered onto Si (100) substrates with thicknesses ranging from 10 to 50 nm under four conditions to investigate the structure, magnetic properties, and surface energy. Under four conditions, the crystal structure of the CoFeY films was found to be amorphous by an X-ray diffraction analyzer (XRD), suggesting that yttrium (Y) added into CoFe films and can be refined in grain size and insufficient annealing temperatures do not induce enough thermal driving force to support grain growth. The saturation magnetization (MS) and low-frequency alternate-current magnetic susceptibility (χac) increased with the increase of the thicknesses and annealing temperatures, indicating the thickness effect and Y can be refined grain size and improved ferromagnetic spin exchange coupling. The highest Ms and χac values of the Co60Fe20Y20 films were 883 emu/cm3 and 0.26 when the annealed temperature was 300 °C and the thickness was 50 nm. The optimal resonance frequency (fres) was 50 Hz with the maximum χac value, indicating it could be used at a low frequency range. Moreover, the surface energy increased with the increase of the thickness and annealing temperature. The maximum surface energy of the annealed 300 °C film was 30.02 mJ/mm2 at 50 nm. Based on the magnetic and surface energy results, the optimal thickness was 50 nm annealed at 300 °C, which has the highest Ms, χac, and a strong adhesion, which can be as a free or pinned layer that could be combined with the magnetic tunneling layer and applied in magnetic fields.

Annealing Effect on the Characteristics of Co40Fe40W10B10 Thin Films on Si(100) Substrate.

This research explores the behavior of Co40Fe40W10B10 when it is sputtered onto Si(100) substrates with a thickness (tf) ranging from 10 nm to 100 nm, and then altered by an annealing process at temperatures of 200 °C, 250 °C, 300 °C, and 350 °C, respectively. The crystal structure and grain size of Co40Fe40W10B10 films with different thicknesses and annealing temperatures are observed and estimated by an X-ray diffractometer pattern (XRD) and full-width at half maximum (FWHM). The XRD of annealing Co40Fe40W10B10 films at 200 °C exhibited an amorphous status due to insufficient heating drive force. Moreover, the thicknesses and annealing temperatures of body-centered cubic (BCC) CoFe (110) peaks were detected when annealing at 250 °C with thicknesses ranging from 80 nm to 100 nm, annealing at 300 °C with thicknesses ranging from 50 nm to 100 nm, and annealing at 350 °C with thicknesses ranging from 10 nm to 100 nm. The FWHM of CoFe (110) decreased and the grain size increased when the thickness and annealing temperature increased. The CoFe (110) peak revealed magnetocrystalline anisotropy, which was related to strong low-frequency alternative-current magnetic susceptibility (χac) and induced an increasing trend in saturation magnetization (Ms) as the thickness and annealing temperature increased. The contact angles of all Co40Fe40W10B10 films were less than 90°, indicating the hydrophilic nature of Co40Fe40W10B10 films. Furthermore, the surface energy of Co40Fe40W10B10 presented an increased trend as the thickness and annealing temperature increased. According to the results, the optimal conditions are a thickness of 100 nm and an annealing temperature of 350 °C, owing to high χac, large Ms, and strong adhesion; this indicates that annealing Co40Fe40W10B10 at 350 °C and with a thickness of 100 nm exhibits good thermal stability and can become a free or pinned layer in a magnetic tunneling junction (MTJ) application.

Direct probe of heterojunction effects upon photoconductive properties of TiO2 nanotubes fabricated by atomic layer deposition.

This study investigated Schottky- and ohmic-contact effects upon the photoresponses of ITO/TiO(2)/Si and Ti/TiO(2)/Si nanotube-based photodiodes. The TiO(2) tube arrays were fabricated by atomic layer deposition (ALD) and shaped by an anodic aluminum oxide (AAO) template on a p-type Si substrate. The contact area between the electrode (Ti or ITO) and the TiO(2)'s tip was varied by tuning the tube's inner wall thickness with ALD, providing a direct and systematic probe of the heterojunction effects upon the photodiodes' responses. Results show that the Ti/TiO(2)/Si diode exhibits a highly thickness-dependent photoresponse. This is because the photocurrent is driven by the p-n junction at TiO(2)/Si alone and it faces no retarding at the ohmic contact of Ti/TiO(2). For the ITO/TiO(2)/Si diode, the Schottky contact at ITO/TiO(2) regulates photocurrent overriding TiO(2)/Si as a result of higher efficiency in photogeneration, leading to the opposite response compared with the Ti/TiO(2)/Si diode. Respective energy band diagrams are provided to support the statements above, and a consistent picture is obtained for both time response and quantum efficiency measurements.

Anisotropic Collective Charge Excitations in Quasimetallic 2D Transition-Metal Dichalcogenides.

The quasimetallic 1T' phase 2D transition-metal dichalcogenides (TMDs) consist of 1D zigzag metal chains stacked periodically along a single axis. This gives rise to its prominent physical properties which promises the onset of novel physical phenomena and applications. Here, the in-plane electronic correlations are explored, and new mid-infrared plasmon excitations in 1T' phase monolayer WSe2 and MoS2 are observed using optical spectroscopies. Based on an extensive first-principles study which analyzes the charge dynamics across multiple axes of the atomic-layered systems, the collective charge excitations are found to disperse only along the direction perpendicular to the chains. Further analysis reveals that the interchain long-range coupling is responsible for the coherent 1D charge dynamics and the spin-orbit coupling affects the plasmon frequency. Detailed investigation of these charge collective modes in 2D-chained systems offers opportunities for novel device applications and has implications for the underlying mechanism that governs superconductivity in 2D TMD systems.

Unraveling High-Yield Phase-Transition Dynamics in Transition Metal Dichalcogenides on Metallic Substrates.

2D transition metal dichalcogenides (2D-TMDs) and their unique polymorphic features such as the semiconducting 1H and quasi-metallic 1T' phases exhibit intriguing optical and electronic properties, which can be used in novel electronic and photonic device applications. With the favorable quasi-metallic nature of 1T'-phase 2D-TMDs, the 1H-to-1T' phase engineering processes are an immensely vital discipline exploited for novel device applications. Here, a high-yield 1H-to-1T' phase transition of monolayer-MoS2 on Cu and monolayer-WSe2 on Au via an annealing-based process is reported. A comprehensive experimental and first-principles study is performed to unravel the underlying mechanism and derive the general trends for the high-yield phase transition process of 2D-TMDs on metallic substrates. While each 2D-TMD possesses different intrinsic 1H-1T' energy barriers, the option of metallic substrates with higher chemical reactivity plays a significantly pivotal role in enhancing the 1H-1T' phase transition yield. The yield increase is achieved via the enhancement of the interfacial hybridizations by the means of increased interfacial binding energy, larger charge transfer, shorter interfacial spacing, and weaker bond strength. Fundamentally, this study opens up the field of 2D-TMD/metal-like systems to further scientific investigation and research, thereby creating new possibilities for 2D-TMDs-based device applications.