Damage morphology change condition and thermal accumulation effect on high-reflection coatings at 1064nm.

The damage conversion behavior of high-reflection coatings under multiple shot of 1064nm nanosecond pulse laser has been investigated. The mechanism of initiation and evolution law of multi-shot damage has been revealed by use of surface profiler and focus ion beam with SEM. The scald damage tends to become delaminate damage under some certain condition. Huge experiments supports that this morphology change condition has a close connection with scald initial fluence, scald size, subsequent fluence and shot number. The relationship among these factors is for the first time achieved to offer the "safety lines" for components. The thermal accumulation effect on the decline of damage threshold under multi-shot has been studied in theory and verified experimentally. In addition, a theory-based formula is used to fit the experiment data for further prediction of thin film life-time.

Characterization of 1064nm nanosecond laser-induced damage on antireflection coatings grown by atomic layer deposition.

Damage tests are carried out at 1064nm to measure the laser resistance of TiO(2)/Al(2)O(3) and HfO(2)/Al(2)O(3) antireflection coatings grown by atomic layer deposition (ALD). The damage results are determined by S-on-1 and R-on-1 tests. Interestingly, the damage performance of ALD coatings is similar to those grown by conventional e-beam evaporation process. A decline law of damage resistance under multiple irradiations is revealed. The influence of growth temperature on damage performance has been investigated. Result shows that the crystallization of TiO(2) layer at higher temperature could lead to numerous absorption defects that reduce the laser-induced damage threshold (LIDT). In addition, it has been found that using inorganic compound instead of organic compound as precursors for ALD process maybe effectively prevent carbon impurities in films and will increase the LIDT obviously.

Soil carbon supplementation: Improvement of root-surrounding soil bacterial communities, sugar and starch content in tobacco (N. tabacum).

Soil carbon supplementation is known to stimulate plant growth by improving soil fertility and plant nutrient uptake. However, the underlying process and chemical mechanism that could explain the interrelationship between soil carbon supplementation, soil micro-ecology, and the growth and quality of plant remain unclear. In this study, we investigated the influence and mechanism of soil carbon supplementation on the bacterial community, chemical cycling, mineral nutrition absorption, growth and properties of tobacco leaves. The soil carbon supplementation increased amino acid, carbohydrates, chemical energy metabolism, and bacterial richness in the soil. This led to increased content of sugar (23.75%), starch (13.25%), and chlorophyll (10.56%) in tobacco leaves. Linear discriminant analysis revealed 49 key phylotypes and significant increment of some of the Plant Growth-Promoting Rhizobacteria (PGPR) genera (Bacillus, Novosphingobium, Pseudomonas, Sphingomonas) in the rhizosphere, which can influence the tobacco growth. Partial Least Squares Path Modeling (PLS-PM) showed that soil carbon supplementation positively affected the sugar and starch contents in tobacco leaves by possibly altering the photosynthesis pathway towards increasing the aroma of the leaves, thus contributing to enhanced tobacco flavor. These findings are useful for understanding the influence of soil carbon supplementation on bacterial community for improving the yields and quality of tobacco in industrial plantation.

Exogenous application and interaction of biochar with environmental factors for improving functional diversity of rhizosphere's microbial community and health.

The usage of fertilizer with high nitrogen content in many countries, as well as its enormous surplus, has a negative impact on the soil ecological environment in agricultural system. This consumption of nitrogen fertilizer can be minimized by applying biochar to maintain the sufficient supply of nitrogen as nutrient to the near-root zone. This study investigated the effects of various amounts of biochar application (450, 900, 1350, and 1800 kg/hm2) and reduction of nitrogen fertilizer amount (10, 15, 20, and 25%) on the nutrients and microorganism community structure in rhizosphere growing tobacco plant. The microorganism community was found essential in improving nitrogen retention. Compared with conventional treatment, an application of biochar in rhizosphere soil increased the content of soil available phosphorus, organic matter and total nitrogen by 21.47%, 26.34%, and 9.52%, respectively. It also increased the abundance of microorganisms that are capable of degrading and utilizing organic matter and cellulose, such as Actinobacteria and Acidobacteria. The relative abundance of Chloroflexi was also increased by 49.67-78.61%, and the Acidobacteria increased by 14.79-39.13%. Overall, the application of biochar with reduced nitrogen fertilizer amount can regulate the rhizosphere microecological environment of tobacco plants and their microbial population structure, thereby promoting soil health for tobacco plant growth while reducing soil acidification and environmental pollution caused by excessive nitrogen fertilizer.

Laser damage properties of TiO2/Al2O3 thin films grown by atomic layer deposition.

Research on thin film deposited by atomic layer deposition (ALD) for laser damage resistance is rare. In this paper, it has been used to deposit TiO(2)/Al(2)O(3) films at 110 °C and 280 °C on fused silica and BK7 substrates. Microstructure of the thin films was investigated by x-ray diffraction. The laser-induced damage threshold (LIDT) of samples was measured by a damage test system. Damage morphology was studied under a Nomarski differential interference contrast microscope and further checked under an atomic force microscope. Multilayers deposited at different temperatures were compared. The results show that the films deposited by ALD had better uniformity and transmission; in this paper, the uniformity is better than 99% over 100 mm Φ samples, and the transmission is more than 99.8% at 1064 nm. Deposition temperature affects the deposition rate and the thin film microstructure and further influences the LIDT of the thin films. As to the TiO(2)/Al(2)O(3) films, the LIDTs were 6.73±0.47 J/cm(2) and 6.5±0.46 J/cm(2) at 110 °C on fused silica and BK7 substrates, respectively. The LIDTs at 11 °C are notably better than 280 °C.

Effects of annealing atmosphere on the performance of Cu(InGa)Se2 films sputtered from quaternary targets.

Quaternary sputtering without additional selenization is a low-cost alternative method for the preparation of Cu(InGa)Se2 (CIGS) thin film for photovoltaics. However, without selenization, the device efficiency is much lower than that with selenization. To comprehensively examine this problem, we compared the morphologies, depth profiles, compositions, electrical properties and recombination mechanism of the absorbers fabricated with and without additional selenization. The results revealed that the amount of surface Se on CIGS films annealed in a Se-free atmosphere is less than that on CIGS films annealed in a Se-containing atmosphere. Additionally, the lower amount of surface Se reduced the carrier concentration, enhanced the resistivity of the CIGS film and allowed CIGS/CdS interface recombination to be the dominant recombination mechanism of CIGS device. The increase of interface recombination reduced the efficiency of the device annealed in a Se-free atmosphere.

Adaptive laser conditioning of reflective thin film based on photo thermal lens probe.

A novel laser conditioning (LC) concept that performs adaptive control of exposure fluence is proposed. As photo-thermal absorption effect can discover defects responsible for laser-induced damage of reflective thin film, in situ photo-thermal lens probe is introduced in conventional LC procedure to detect defects during raster-scanning. The absorptance signal is fed back to guide the adaptive control of exposure fluence. By this method, the damage risk accompanying with LC can be reduced to a rather low level. In order to test the performance of adaptive laser conditioning (ALC), an experimental setup has been built, and several film samples have been tested. The results show that ALC is effective at reducing laser damage risk.

Atomic layer deposition for fabrication of HfO2/Al2O3 thin films with high laser-induced damage thresholds.

Previous research on the laser damage resistance of thin films deposited by atomic layer deposition (ALD) is rare. In this work, the ALD process for thin film generation was investigated using different process parameters such as various precursor types and pulse duration. The laser-induced damage threshold (LIDT) was measured as a key property for thin films used as laser system components. Reasons for film damaged were also investigated. The LIDTs for thin films deposited by improved process parameters reached a higher level than previously measured. Specifically, the LIDT of the Al2O3 thin film reached 40 J/cm(2). The LIDT of the HfO2/Al2O3 anti-reflector film reached 18 J/cm(2), the highest value reported for ALD single and anti-reflect films. In addition, it was shown that the LIDT could be improved by further altering the process parameters. All results show that ALD is an effective film deposition technique for fabrication of thin film components for high-power laser systems.