Large-Area Preparation of a Robust Superamphiphobic Coating for Chemical Mechanical Polishing Application.

In the chemical-mechanical polishing (CMP) process, the abrasive particles in the polishing slurry tend to agglomerate easily and crystallize on the equipment surfaces during recycling, which can lead to poor wafer processing quality and additional tedious cleaning work. To overcome this issue, a simple and cost-effective self-cleaning surface preparation method has been developed. In this study, elastic and stretchable hydroxyl polydimethylsiloxane (PDMS-OH) was selected as the functional material, it was chelated with pentaerythritol tetra(3-mercapto propionate), and then 2-(perfluorooctyl)ethyl methacrylate was further grafted in situ to the polymer chains via a photoinduced thiol-ene click reaction. Hydrophobically modified micronanoscale silica particles were used to construct robust hierarchical micronanostructures while imparting stable mechanical wear resistance to the coating. The resulting superamphiphobic film exhibits the "lotus effect" and exceptional self-cleaning ability, repelling liquids such as water, hexadecane, and polishing slurry. Furthermore, the coating demonstrated outstanding chemical resistance and antifouling ability. Thus, it provides a feasible solution for preventing abrasive crystallization at critical locations where the polishing slurry flows in the CMP equipment. This work contributes to the enhanced application of superrepellent coatings in the CMP stage of semiconductor material processing.

Cation/Anion Dual-Vacancy Pair Modulated Atomically-Thin Sex -Co3 S4 Nanosheets with Extremely High Water Oxidation Performance in Ultralow-Concentration Alkaline Solutions.

The density functional theory calculation results reveal that the adjacent defect concentration and electronic spin state can effectively activate the CoIII sites in the atomically thin nanosheets, facilitating the thermodynamic transformation of *O to *OOH, thus offering ultrahigh charge transfer properties and efficiently stabilizing the phase. This undoubtedly evidences that, for metal sulfides, the atom-scale cation/anion vacancy pair and surface electronic spin state can play a great role in enhancing the oxygen evolution reaction. Inspired by the theoretical prediction, interconnected selenium (Se) wired ultrathin Co3 S4 (Sex -Co3 S4 ) nanosheets with Co/S (Se) dual-vacancies (Se1.0 -Co3 S4 -VS/Se -VCo ) pairs are constructed by a simple approach. As an efficient sulfur host material, in an ultralow-concentration KOH solution (0.1 m), Se1.0 -Co3 S4 -VS/Se -VCo presents outstanding durability up to 165 h and a low overpotential of 289.5 mV at 10 mA cm-2 , which outperform the commercial Co3 S4 nanosheets (NSs) and RuO2 . Moreover, the turnover frequency of Se1.0 -Co3 S4 -VS/Se -VCo is 0.00965 s-1 at an overpotential of 0.39 V, which is 5.7 times that of Co3 S4 NSs, and 5.8 times that of commercial RuO2 . The finding offers a rational design strategy to create the multi-defect structure in catalysts toward high-efficiency water electrolysis.