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Using nonthermal plasma (NTP) to promote CO2 hydrogenation is one of the most promising approaches that overcome the limitations of conventional thermal catalysis. However, the catalytic surface reaction dynamics of NTP-activated species are still under debate. The NTP-activated CO2 hydrogenation was investigated in Pd2Ga/SiO2 alloy catalysts and compared to thermal conditions. Although both thermal and NTP conditions showed close to 100% CO selectivity, it is worth emphasizing that when activated by NTP, CO2 conversion not only improves more than 2-fold under thermal conditions but also breaks the thermodynamic equilibrium limitation. Mechanistic insights into NTP-activated species and alloy catalyst surface were investigated by using in situ transmission infrared spectroscopy, where catalyst surface species were identified during NTP irradiation. Moreover, in in situ X-ray absorption fine-structure analysis under reaction conditions, the catalyst under NTP conditions not only did not undergo restructuring affecting CO2 hydrogenation but also could clearly rule out catalyst activation by heating. In situ characterizations of the catalysts during CO2 hydrogenation depict that vibrationally excited CO2 significantly enhances the catalytic reaction. The agreement of approaches combining experimental studies and density functional theory (DFT) calculations substantiates that vibrationally excited CO2 reacts directly with hydrogen adsorbed on Pd sites while accelerating formate formation due to neighboring Ga sites. Moreover, DFT analysis deduces the key reaction pathway that the decomposition of monodentate formate is promoted by plasma-activated hydrogen species. This work enables the high designability of CO2 hydrogenation catalysts toward value-added chemicals based on the electrification of chemical processes via NTP.
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A kinetic study revealed that a Ni/Al2O3 catalyst exhibited a drastic increase in CH4 and CO2 conversion under nonthermal plasma when lanthanum was added to the Ni/Al2O3 catalyst as a promoter. For a better fundamental understanding of the plasma and catalyst interfacial phenomena, we employed in situ diffuse reflectance infrared Fourier transform spectroscopy (DRIFTS) under plasma-on conditions to elucidate the nonthermal plasma-enabled reaction enhancement mechanisms. Compared with thermal catalysis, plasma-activated CO2 shows a 1.7-fold enhancement for bidentate (1560 and 1290 cm-1) and monodentate carbonate (1425 and 1345 cm-1) formation on La. Moreover, new peaks of bicarbonate (1655 cm-1) and bridge carbonate (1720 cm-1) were formed due to nonthermal plasma interactions. CO2-TPD study after thermal- and plasma-activated CO2 treatment further confirmed that plasma-activated CO2 enhances bidentate and monodentate carbonate generation with a 1.5-fold promotion at high temperature (500 °C). XRD and EDS analyses suggest that atomic-scale interaction between CO2-La and CHx-Ni is possible over the complex La-Ni-Al oxide; vibrationally excited CO2-induced carbonates provide the key to enhancing the overall performance of CH4 dry reforming at low temperature.
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We investigate the size-dependent optical extinction properties of colloidal silicon nanocrystals (Si NCs) from the near infrared (NIR) to the ultraviolet (UV). Experimental results are compared to the Mie solution to Maxwell's equations using the same refractive index as bulk Si to evaluate the deviation from bulk properties. We find that the energy for the lowest direct transition (E(1)) continuously blueshifts from near bulk-like at ~3.4 eV in large NCs (16 nm) to ~3.6 eV for small NCs (3.9 nm), contrary to the Mie solution. The extinction cross-section of NCs on a per atom basis was found to be independent of the NC size, within our experimental resolution. The results suggest that quantum confinement effects strongly influence excitons associated with the E(1) transition.
Assuntos
Nanopartículas/química , Fenômenos Ópticos , Tamanho da Partícula , Silício/química , Cloro/química , Espectrofotometria Infravermelho , Espectrofotometria Ultravioleta , Propriedades de SuperfícieRESUMO
The voltage-controlled magnetic anisotropy (VCMA) effect is a key to realising high-speed, ultralow-power consumption spintronic devices. The fcc-Co-(111)-based stack is a promising candidate for the achievement of large VCMA coefficients. However, only a few studies on the fcc-Co-(111)-based stack have been reported and the VCMA effect has not been well understood. Previously, we observed a significant increase in the voltage-controlled coercivity (VCC) in the Pt/Ru/Co/CoO/TiOx structure upon post-annealing. However, the mechanism underlying this enhancement remains unclear. This study performs multiprobe analyses on this structure before and after post-annealing and discusses the origin of the VCMA effect at the Co/oxide interface. X-ray magnetic circular dichroism measurement revealed an increase in the orbital magnetic moment owing to post-annealing, accompanied by a significant increase in VCC. We speculate that the diffusion of Pt atoms into the vicinity of Co/oxide interface enhances the interfacial orbital magnetic moment and the VCMA at the interface. These results provide a guideline for designing structures to obtain a large VCMA effect in fcc-Co-(111)-based stacks.
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Fenômenos Magnéticos , Óxidos , Anisotropia , Fenômenos Físicos , DifusãoRESUMO
The quantum anomalous Hall (QAH) effect is characterized by a dissipationless chiral edge state with a quantized Hall resistance at zero magnetic field. Manipulating the QAH state is of great importance in both the understanding of topological quantum physics and the implementation of dissipationless electronics. Here, the QAH effect is realized in the magnetic topological insulator Cr-doped (Bi,Sb)2 Te3 (CBST) grown on an uncompensated antiferromagnetic insulator Al-doped Cr2 O3 . Through polarized neutron reflectometry (PNR), a strong exchange coupling is found between CBST and Al-Cr2 O3 surface spins fixing interfacial magnetic moments perpendicular to the film plane. The interfacial coupling results in an exchange-biased QAH effect. This study further demonstrates that the magnitude and sign of the exchange bias can be effectively controlled using a field training process to set the magnetization of the Al-Cr2 O3 layer. It demonstrates the use of the exchange bias effect to effectively manipulate the QAH state, opening new possibilities in QAH-based spintronics.
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Silicon nanocrystals have recently attracted significant attention for applications in electronics, optoelectronics, and biological imaging due to their size-dependent optical and electronic properties. Here a method for synthesizing luminescent silicon nanocrystals from silicon tetrachloride with a nonthermal plasma is described. Silicon nanocrystals with mean diameters of 3-15 nm are synthesized and have a narrow size distribution with the standard deviation being less than 20% of the mean size. Control over crystallinity is achieved for plasma pressures of 1-12 Torr and hydrogen gas concentrations of 5-70% through adjustment of the plasma power. The size of nanocrystals, and resulting optical properties, is mainly dependent on the gas residence time in the plasma region. Additionally the surface of the nanocrystals is covered by both hydrogen and chlorine. Oxidation of the nanocrystals, which is found to follow the Cabrera-Mott mechanism under ambient conditions, is significantly faster than hydrogen terminated silicon due to partial termination of the nanocrystal surface by chlorine.
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There is urgent need for spintronics materials exhibiting a large voltage modulation effect to fulfill the great demand for high-speed, low-power-consumption information processing systems. Fcc-Co (111)-based systems are a promising option for research on the voltage effect, on account of their large perpendicular magnetic anisotropy (PMA) and high degree of freedom in structure. Aiming to observe a large voltage effect in a fcc-Co (111)-based system at room temperature, we investigated the voltage-induced coercivity (Hc) change of perpendicularly magnetized Pt/heavy metal/Co/CoO/amorphous TiOx structures. The thin CoO layer in the structure was the result of the surface oxidation of Co. We observed a large voltage-induced Hc change of 20.2 mT by applying 2 V (0.32 V/nm) to a sample without heavy metal insertion, and an Hc change of 15.4 mT by applying 1.8 V (0.29 V/nm) to an Ir-inserted sample. The relative thick Co thickness, Co surface oxidation, and large dielectric constant of TiOx layer could be related to the large voltage-induced Hc change. Furthermore, we demonstrated the separate adjustment of Hc and a voltage-induced Hc change by utilizing both upper and lower interfaces of Co.
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Silicon nanocrystals (SiNCs) featuring size-dependent novel optical and electrical properties have been widely employed for various functional devices. We have demonstrated SiNC-based hybrid photovoltaics (SiNC-HPVs) and proposed several approaches for performance promotion. Recently, owing to the superiorities such as low power operation, high portability, and designability, organic photovoltaics (OPVs) have been extensively studied for their potential indoor applications as power sources. SiNCs exhibit strong light absorption below 450 nm, which is capable of sufficient photocurrent generation under UV irradiation. Therefore, SiNC-HPVs are expected to be preferably used for energy harvesting systems in indoor applications because an indoor light source consists of a shorter wavelength component below 500 nm than solar light. We successfully demonstrated SiNC-HPVs with a PCE as high as 9.7%, corresponding to the output power density of 34.0 µW cm-2 under standard indoor light irradiation (1000 lx). In addition, we have found that SiNC defects working as electron traps influence the electrical properties of SiNCs substantially, a thermal annealing process was conducted towards the suppression of defects and the improvement of the SiNC-HPVs performance.
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Plasma-catalytic oxidation of particulate matter (PM) has potential applications for diesel exhaust cleaning. There is a grand requirement to explore the mechanism of carbonaceous PM oxidation for the development of plasma catalysts. Herein, Au/γ-Al2O3 was used to catalyze the gasification of the graphitic carbon. A modified diffuse reflectance infrared Fourier transform spectrometer equipped with a mass spectrometer was originally utilized to in situ characterize the surface intermediates of graphite on Au/γ-Al2O3 and the gaseous products during the discharges processes in the O2-He balanced gases. It was found that O atoms and O3 play important roles in the formation of surface oxygen complexes (SOCs) and facilitate the gasification of SOCs to CO2 in the presence of Au/γ-Al2O3. The findings are helpful to understand the plasma-catalytic oxidation mechanism of PM and further develop efficient plasma catalysts.
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Plasma-catalysis technologies (PCTs) have the potential to control the emissions of volatile organic compounds, although their low-energy efficiency is a bottleneck for their practical applications. A plasma-catalyst reactor filled with a CeO2/γ-Al2O3 catalyst was developed to decompose toluene with a high-energy efficiency enhanced by the elevating reaction temperature. When the reaction temperature was raised from 50 °C to 250 °C, toluene conversion dramatically increased from 45.3% to 95.5% and the energy efficiency increased from 53.5 g/kWh to 113.0 g/kWh. Conversely, the toluene conversion using a thermal catalysis technology (TCT) exhibited a maximum of 16.7%. The activation energy of toluene decomposition using PCTs is 14.0 kJ/mol, which is far lower than those of toluene decomposition using TCTs, which implies that toluene decomposition using PCT differs from that using TCT. The experimental results revealed that the Ce3+/Ce4+ ratio decreased and Oads/Olatt ratio increased after the 40-h evaluation experiment, suggesting that CeO2 promoted the formation of the reactive oxygen species that is beneficial for toluene decomposition.
Assuntos
Poluentes Atmosféricos/análise , Gases em Plasma/química , Tolueno/análise , Compostos Orgânicos Voláteis/análise , Óxido de Alumínio/química , Catálise , Cério/química , Temperatura Alta , Modelos Teóricos , OxirreduçãoRESUMO
Integration of a quantum anomalous Hall insulator with a magnetically ordered material provides an additional degree of freedom through which the resulting exotic quantum states can be controlled. Here, an experimental observation is reported of the quantum anomalous Hall effect in a magnetically-doped topological insulator grown on the antiferromagnetic insulator Cr2 O3 . The exchange coupling between the two materials is investigated using field-cooling-dependent magnetometry and polarized neutron reflectometry. Both techniques reveal strong interfacial interaction between the antiferromagnetic order of the Cr2 O3 and the magnetic topological insulator, manifested as an exchange bias when the sample is field-cooled under an out-of-plane magnetic field, and an exchange spring-like magnetic depth profile when the system is magnetized within the film plane. These results identify antiferromagnetic insulators as suitable candidates for the manipulation of magnetic and topological order in topological insulator films.
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Carbon oxidation has two stages, the first is the formation of surface oxides and the second is the gasification of the surface oxides to CO2. Calcium carbonate (CaCO3) was used to catalyze the gasification of the surface oxides. The catalytic effect of on graphite oxidation and its catalytic mechanism were studied by using thermogravimetric technique and in situ diffuse reflectance infrared Fourier transform spectroscopy (DRIFTS). It was found that characteristic temperature (T50) of graphite oxidation with CaCO3 was 946 K, 113 K lower than that of graphite only. DRIFTS analysis results show that surface oxides (adsorbed CO2 and carbonate CO32-) were formed on the graphite surface at a temperature above 473 K, carbonate products on graphite surface disappeared when CaCO3 was present; formation of CO32- on CaCO3 surface was confirmed, this CO32- may be more easily gasified into gaseous CO2. The kinetic analysis results showed that CaCO3 promoted graphite oxidation has an activation energy of 74.3 kJ mol-1, far lower than that of graphite (148 kJ mol-1).
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The plasma-catalytic oxidation of methane (CH4) is a potential reaction for controlling CH4 emissions at low temperatures. However, the mechanism of the CH4 plasma-catalytic oxidation is still unknown, which inhibits the further optimization of the oxidation process. Herein, a CH4 oxidation mechanism over an Au/γ-Al2O3 catalyst was proposed based on our experimental findings. CH4 is first decomposed to CH3 and H by the discharge, and a fraction of the CH3 is adsorbed on γ-Al2O3 surface for deep oxidation. The oxygen atoms produced by the discharge react with H2O to yield surface reactive OH groups that contribute to the CH3 oxidation. Oxygen atoms also promote the release of H2O from the surfaces of the γ-Al2O3 and Au/γ-Al2O3 and especially promote CO2 desorption from the surface of the Au/γ-Al2O3. When γ-Al2O3 was used as the catalyst, the CO2 selectivity was only 15 vol.%, and the CH4 conversion decreased after 7 h of plasma-catalytic oxidation. In contrast, when Au/γ-Al2O3 was used, the CO2 selectivity was 80 vol.%, long-term CH4 conversion was obtained. Experimental results revealed that Au was beneficial for the decomposition of surface carbonate species into gaseous CO2, whereas the carbonate species accumulated on γ-Al2O3 when Au was absent.
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A dielectric barrier discharge (DBD) catalyst hybrid reactor with CeO2/γ-Al2O3 catalyst balls was investigated for benzene decomposition at atmospheric pressure and 30⯰C. At an energy density of 37-40â¯J/L, benzene decomposition was as high as 92.5% when using the hybrid reactor with 5.0wt%CeO2/γ-Al2O3; while it was 10%-20% when using a normal DBD reactor without a catalyst. Benzene decomposition using the hybrid reactor was almost the same as that using an O3 catalyst reactor with the same CeO2/γ-Al2O3 catalyst, indicating that O3 plays a key role in the benzene decomposition. Fourier transform infrared spectroscopy analysis showed that O3 adsorption on CeO2/γ-Al2O3 promotes the production of adsorbed O2- and O22â, which contribute benzene decomposition over heterogeneous catalysts. Nano particles as by-products (phenol and 1,4-benzoquinone) from benzene decomposition can be significantly reduced using the CeO2/γ-Al2O3 catalyst. H2O inhibits benzene decomposition; however, it improves CO2 selectivity. The deactivated CeO2/γ-Al2O3 catalyst can be regenerated by performing discharges at 100⯰C and 192-204â¯J/L. The decomposition mechanism of benzene over CeO2/γ-Al2O3 catalyst was proposed.
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Temporal evolution of surface chemistry during oxidation of silicon quantum dot (Si-QD) surfaces were probed using surface-enhanced Raman scattering (SERS). A monolayer of hydrogen and chlorine terminated plasma-synthesized Si-QDs were spin-coated on silver oxide thin films. A clearly enhanced signal of surface modes, including Si-Clx and Si-Hx modes were observed from as-synthesized Si-QDs as a result of the plasmonic enhancement of the Raman signal at Si-QD/silver oxide interface. Upon oxidation, a gradual decrease of Si-Clx and Si-Hx modes, and an emergence of Si-Ox and Si-O-Hx modes have been observed. In addition, first, second and third transverse optical modes of Si-QDs were also observed in the SERS spectra, revealing information on the crystalline morphology of Si-QDs. An absence of any of the abovementioned spectral features, but only the first transverse optical mode of Si-QDs from thick Si-QD films validated that the spectral features observed from Si-QDs on silver oxide thin films are originated from the SERS effect. These results indicate that real-time SERS is a powerful diagnostic tool and a novel approach to probe the dynamic surface/interface chemistry of quantum dots, especially when they involve in oxidative, catalytic, and electrochemical surface/interface reactions.
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Voltage-dependent potassium (Kv) channels allow for the selective permeability of potassium ions in a membrane potential dependent manner, playing crucial roles in neurotransmission and muscle contraction. Kv channel is a tetramer, in which each subunit possesses a voltage-sensing domain (VSD) and a pore domain (PD). Although several lines of evidence indicated that membrane depolarization is sensed as the movement of helix S4 of the VSD, the detailed voltage-sensing mechanism remained elusive, due to the difficulty of structural analyses at resting potential. In this study, we conducted a comprehensive disulfide locking analysis of the VSD using 36 double Cys mutants, in order to identify the proximal residue pairs of the VSD in the presence or absence of a membrane potential. An intramolecular SS-bond was formed between 6 Cys pairs under both polarized and depolarized environment, and one pair only under depolarized environment. The multiple conformations captured by the SS-bond can be divided by two states, up and down, where S4 lies on the extracellular and intracellular sides of the membrane, respectively, with axial rotation of 180°. The transition between these two states is caused by the S4 translocation of 12 Å, enabling allosteric regulation of the gating at the PD.
Assuntos
Proteínas Arqueais/química , Ativação do Canal Iônico , Canais de Potássio de Abertura Dependente da Tensão da Membrana/química , Aeropyrum , Substituição de Aminoácidos , Proteínas Arqueais/genética , Proteínas Arqueais/fisiologia , Compostos Bicíclicos com Pontes/química , Cistina/química , Cistina/genética , Corantes Fluorescentes/química , Lipossomos/química , Potenciais da Membrana , Canais de Potássio de Abertura Dependente da Tensão da Membrana/genética , Canais de Potássio de Abertura Dependente da Tensão da Membrana/fisiologia , Conformação Proteica em alfa-Hélice , Espectrometria de FluorescênciaRESUMO
Responding to the need for thermoelectric materials with high efficiency in both conversion and cost, we developed a nanostructured bulk silicon thermoelectric materials by sintering silicon crystal quantum dots of several nanometers in diameters synthesized by plasma-enhanced chemical vapor deposition (PECVD). The material consists of hybrid structures of nanograins of crystalline silicon and amorphous silicon oxide. The percolated nanocrystalline region gives rise to high power factor with the high doping concentration realized by PECVD, and the binding amorphous region reduces thermal conductivity. Consequently, the nondimensional figure of merit reaches 0.39 at 600 °C, equivalent to the best reported value for silicon thermoelectrics. The thermal conductivity of the densely packed material is as low as 5 W m(-1) K(-1) in a wide temperature range from room temperature to 1000 °C, which is beneficial not only for the conversion efficiency but also for material cost by requiring less material to establish certain temperature gradient.
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Voltage-dependent K(+) (Kv) channels play crucial roles in nerve and muscle action potentials. Voltage-sensing domains (VSDs) of Kv channels sense changes in the transmembrane potential, regulating the K(+)-permeability across the membrane. Gating modifier toxins, which have been used for the functional analyses of Kv channels, inhibit Kv channels by binding to VSD. However, the structural basis for the inhibition remains elusive. Here, fluorescence and NMR analyses of the interaction between VSD derived from KvAP channel and its gating modifier toxin, VSTx1, indicate that VSTx1 recognizes VSD under depolarized condition. We identified the VSD-binding residues of VSTx1 and their proximal residues of VSD by the cross-saturation (CS) and amino acid selective CS experiments, which enabled to build a docking model of the complex. These results provide structural basis for the specific binding and inhibition of Kv channels by gating modifier toxins.
Assuntos
Bloqueadores dos Canais de Potássio/química , Bloqueadores dos Canais de Potássio/farmacologia , Canais de Potássio de Abertura Dependente da Tensão da Membrana/antagonistas & inibidores , Canais de Potássio de Abertura Dependente da Tensão da Membrana/química , Toxinas Biológicas/química , Toxinas Biológicas/farmacologia , Sítios de Ligação , Ativação do Canal Iônico/efeitos dos fármacos , Modelos Moleculares , Conformação Molecular , Simulação de Acoplamento Molecular , Ressonância Magnética Nuclear Biomolecular , Ligação Proteica , Domínios e Motivos de Interação entre Proteínas , Relação Estrutura-AtividadeRESUMO
Localized surface plasmon resonance (LSPR) of doped Si nanocrystals (NCs) is critical to the development of Si-based plasmonics. We now experimentally show that LSPR can be obtained from both B- and P-doped Si NCs in the mid-infrared region. Both experiments and calculations demonstrate that the Drude model can be used to describe the LSPR of Si NCs if the dielectric screening and carrier effective mass of Si NCs are considered. When the doping levels of B and P are similar, the LSPR energy of B-doped Si NCs is higher than that of P-doped Si NCs because B is more efficiently activated to produce free carriers than P in Si NCs. We find that the plasmonic coupling between Si NCs is effectively blocked by oxide at the NC surface. The LSPR quality factors of B- and P-doped Si NCs approach those of traditional noble metal NCs. We demonstrate that LSPR is an effective means to gain physical insights on the electronic properties of doped Si NCs. The current work on the model semiconductor NCs, i.e., Si NCs has important implication for the physical understanding and practical use of semiconductor NC plasmonics.
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The doping of semiconductor nanocrystals (NCs), which is vital for the optimization of NC-based devices, remains a significant challenge. While gas-phase plasma approaches have been successful in incorporating dopant atoms into NCs, little is known about their electronic activation. Here, we investigate the electronic properties of doped silicon NC thin films cast from solution by field effect transistor analysis. We find that, analogous to bulk silicon, boron and phosphorus electronically dope Si NC thin films; however, the dopant activation efficiency is only â¼10(-2)-10(-4). We also show that surface doping of Si NCs is an effective way to alter the carrier concentrations in Si NC films.