RESUMO
We report on determining the optical constants of Ta in the sub-extreme ultraviolet (EUV) spectral range 5.0-24.0 nm from the angle-dependent reflectance (ADR) measured using monochromatized synchrotron radiation. Two sputtered samples with differing thicknesses were investigated. Complementarily x-ray reflectance was measured at shorter wavelengths and evaluated by Fourier transform to facilitate an unambiguous selection of a model for the data evaluation based on an inverse solution of the Fresnel's equations for a layered system. Bayesian inferences coupled with a Nested Sampling (NS) algorithm were utilized to derive the optical constants with their corresponding uncertainties. This report further emphasizes the applicability of an acclaimed NS algorithm on a high-dimensional inverse problem. We explore the possibility of addressing the correlations between the optical constants of thin films and their structural parameters based on other established studies.
RESUMO
The determination of fundamental optical parameters is essential for the development of new optical elements such as mirrors, gratings, or photomasks. Especially in the extreme ultraviolet (EUV) and soft x-ray spectral range, the existing databases for the refractive indices of many materials and compositions are insufficient or are a mixture of experimentally measured and calculated values from atomic scattering factors. Since the physical properties of bulk materials and thin films with thicknesses in the nanometer range are not identical, measurements need to be performed on thin layers. In this study we demonstrate how optical constants of various thin film samples on a bulk substrate can be determined from reflection measurements in the EUV photon energy range from 62 eV to 124 eV. Thin films with thickness of 20 nm to 50 nm of pure Mo, Ni, Pt, Ru, Ta, and Te and different compositions of NixAlx, PtTe, PtxMo, RuxTax, Ru3Re, Ru2W, and TaTeN were prepared by DC magnetron sputtering and measured using EUV reflectometry. The determination optical constants of the different materials are discussed and compared to existing tabulated values.
RESUMO
The resonance and nonresonant laser ionization of uranium atoms sputtered from thin metal films and individual micrometer-size uranium oxide particles, respectively, was studied to evaluate a new setup for the analysis of actinide-containing micrometer-size particles. Experiments using nonresonant (193-nm) ionization of atoms and molecules sputtered from micrometer-size uranium oxide particles have shown that the uranium detection efficiencies for sputtered neutral atoms are approximately 2 orders of magnitude higher than for secondary ions. In uranium particles of 0.5-microm diameter, 6 x 10(6) atoms of 235U were easily detected and the isotopic ratio of 235U/238U = 0.0048 +/- 4.6% is in excellent agreement with the certified value. The use of two-color, two-step resonance ionization of the sputtered neutral uranium atoms from thin films was investigated. Several excitation schemes were tested, and a significant population of several low-lying metastable states after ion sputtering was observed. Autoionizing states for double-resonant ionization were determined, and the high selectivity of ionization schemes involving these autoionizing states was illustrated by comparing the flight-time distributions of different sputtered species obtained both by resonance and nonresonant multiphoton (355-nm) laser postionization. Ideally, the options for resonance as well as nonresonant ionization would be combined in a single setup, to obtain a large gain in sensitivity and selectivity. Thus, information about the main components as well as specific isotopic information of a trace element could be obtained from the same single particle.