Self-improving dystrophic epidermolysis bullosa with a novel heterozygous missense variant in the COL7A1 gene in a Taiwanese family.

Self-improving dystrophic epidermolysis bullosa (DEB) is a genodermatosis that is inherited autosomal dominantly or recessively, and its clinical symptoms may improve or subside spontaneously. Herein, we report a case of self-improving DEB with COL7A1 p.Gly2025Asp variant. The diagnosis was made through histopathological, electron microscopic examination, and genetic testing. The same variant is also noted on his father, who presents with dystrophic toenails without any blisters. This study highlights that idiopathic nail dystrophy could be linked to congenital or hereditary disease. Furthermore, we conducted a review of the literature on the characteristics of reported cases of self-improving DEB with a personal or family history of nail dystrophy. The results supported our findings that nail dystrophy may be the sole manifestation in some family members. We suggest that individuals suffering from idiopathic nail dystrophy may seek genetic counselling when planning pregnancy to early evaluate the potential risk of hereditary diseases.

Contact Engineering High-Performance n-Type MoTe2 Transistors.

Semiconducting MoTe2 is one of the few two-dimensional (2D) materials with a moderate band gap, similar to silicon. However, this material remains underexplored for 2D electronics due to ambient instability and predominantly p-type Fermi level pinning at contacts. Here, we demonstrate unipolar n-type MoTe2 transistors with the highest performance to date, including high saturation current (>400 µA/µm at 80 K and >200 µA/µm at 300 K) and relatively low contact resistance (1.2 to 2 kΩ·µm from 80 to 300 K), achieved with Ag contacts and AlOx encapsulation. We also investigate other contact metals (Sc, Ti, Cr, Au, Ni, Pt), extracting their Schottky barrier heights using an analytic subthreshold model. High-resolution X-ray photoelectron spectroscopy reveals that interfacial metal-Te compounds dominate the contact resistance. Among the metals studied, Sc has the lowest work function but is the most reactive, which we counter by inserting monolayer hexagonal boron nitride between MoTe2 and Sc. These metal-insulator-semiconductor (MIS) contacts partly depin the metal Fermi level and lead to the smallest Schottky barrier for electron injection. Overall, this work improves our understanding of n-type contacts to 2D materials, an important advance for low-power electronics.

Physical and electrical characteristics of Si/SiC quantum dot superlattice solar cells with passivation layer of aluminum oxide.

In this work, we numerically simulate the silicon (Si)/silicon carbide (SiC) quantum dot superlattice solar cell (SiC-QDSL) with aluminum oxide (Al2O3-QDSL) passivation. By exploiting the passivation layer of Al2O3, the high photocurrent and the conversion efficiency can be achieved without losing the effective bandgap. Based on the two-photon transition mechanism in an AM1.5 and a one sun illumination, the simulated short-circuit current (J sc) of 4.77 mA cm-2 is very close to the experimentally measured 4.75 mA cm-2, which is higher than those of conventional SiC-QDSLs. Moreover, the efficiency fluctuation caused by the structural variation is less sensitive by using the passivation layer. A high conversion efficiency of 17.4% is thus estimated by adopting the QD's geometry used in the experiment; and, it can be further boosted by applying a hexagonal QD formation with an inter-dot spacing of 0.3 nm.

Band Alignments of Ternary Wurtzite and Zincblende III-Nitrides Investigated by Hybrid Density Functional Theory.

Band gaps and electron affinities of binary and ternary, wurtzite (wz-) and zincblende (zb-) III-nitrides are investigated using a unified hybrid density functional theory, and band offsets between wz- and zb- alloys are calculated using Anderson's electron affinity model. A conduction (and valence) band offset of 1.85 (0.89) eV has been calculated for zb-GaN/InN heterojunctions, which is 0.25 eV larger (and 0.26 eV smaller) than that of the wz- counterpart. Such polarization-free zb-GaN/InGaN/GaN quantum well structures with large conduction band offsets have the potential to suppress electron leakage current and quantum-confined Stark effects (QCSEs). Contrarily, the conduction (and valence) band offset of zb-AlN/GaN heterojunctions is calculated to be 1.32 (0.43) eV, which is 1.15 eV smaller (and 0.13 eV larger) than that of the wz- case. The significant reduction in zb-AlN/GaN band offsets is ascribed to the smaller and indirect band gap of zb-AlN-the direct-to-indirect crossover point in zb-Al X Ga1-X N is when X ∼ 65%. The small band gap of the zb-AlN barrier and the small conduction band offsets imply that electrons can be injected into zb-AlN/GaN/AlN quantum well heterostructures with small bias and less energy loss when captured by the quantum wells, respectively, i.e., loss as heat is reduced. The band gap of ternary III-nitrides does not linearly depend on alloy compositions, implying a nonlinear dependence of band offsets on compositions. As a result, the large bowing of the conduction band offset is identified and ascribed to the cation-like behavior of the conduction band minimum, while the linear dependence of the valence band offset on compositions is attributed to the anion-like character of the valence band maximum.